Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | KCNN4 | O15554 | 4/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16648876 | 0.83 | CYP2C19 (0.39) | CYP2C19HIF1AKCNN4TSHRTAAR1 | |
| SCHEMBL704484 | 0.77 | KCNN4 (0.40) | CYP2C19HIF1AKCNN4TSHRTAAR1 | |
| SCHEMBL4620006 | 0.77 | KCNN4 (0.40) | CYP2C19HIF1AKCNN4TAAR1MAPK1 | |
| SCHEMBL707329 | 0.77 | KCNN4 (0.45) | CYP2C19HIF1AKCNN4TSHRTAAR1 | |
| SCHEMBL10448326 | 0.76 | CYP2C19 (0.41) | CYP2C19HIF1AKCNN4TSHRTAAR1 | |
| SCHEMBL10808021 | 0.75 | CYP2C19 (0.54) | CYP2C19HIF1AKCNN4TAAR1MAPK1 | |
| SCHEMBL599044 | 0.75 | CYP2C19 (0.54) | CYP2C19HIF1AKCNN4TAAR1MAPK1 | |
| SCHEMBL28366627 | 0.73 | TSHR (0.50) | CYP2C19HIF1AKCNN4TSHRTAAR1 | |
| SCHEMBL17710390 | 0.73 | CYP2C19 (0.47) | CYP2C19HIF1AKCNN4TSHRTAAR1 | |
| SCHEMBL713410 | 0.72 | MAPK1 (0.40) | CYP2C19HIF1AKCNN4TSHRTAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |