Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH1 | P35367 | 6/20 | 0.47 |
| ▸ | HTR2A | P28223 | 6/20 | 0.47 |
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.41 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.36 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.35 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.35 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707445 | 0.96 | HRH1 (0.47) | HRH1HTR2ASIGMAR1CYP19A1KCNH2 | |
| SCHEMBL704019 | 0.94 | HRH1 (0.48) | HRH1HTR2ASIGMAR1CYP19A1KCNH2 | |
| SCHEMBL707300 | 0.91 | HRH1 (0.44) | HRH1HTR2ASIGMAR1CYP19A1KCNH2 | |
| SCHEMBL706466 | 0.87 | HRH1 (0.48) | HRH1HTR2ASIGMAR1CYP19A1KCNH2 | |
| SCHEMBL704101 | 0.87 | HRH1 (0.44) | HRH1HTR2ASIGMAR1CYP19A1KCNH2 | |
| SCHEMBL704049 | 0.82 | HRH1 (0.45) | HRH1HTR2ASIGMAR1KCNH2TAAR1 | |
| SCHEMBL702750 | 0.81 | SIGMAR1 (0.41) | HRH1HTR2ASIGMAR1KCNH2 | |
| SCHEMBL3481390 | 0.81 | SIGMAR1 (0.41) | HRH1HTR2ASIGMAR1KCNH2 | |
| SCHEMBL704183 | 0.79 | CA12 (0.40) | HRH1HTR2ASIGMAR1TAAR1 | |
| SCHEMBL708049 | 0.78 | HRH1 (0.47) | HRH1HTR2ASIGMAR1CYP19A1KCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |