⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705037 | 0.76 | — | — | |
| SCHEMBL705840 | 0.76 | — | — | |
| SCHEMBL707582 | 0.75 | — | — | |
| SCHEMBL4266461 | 0.75 | — | — | |
| SCHEMBL28056397 | 0.73 | ALDH1A1 (0.35) | — | |
| SCHEMBL11805653 | 0.73 | — | — | |
| Methylamine SCHEMBL2795832 | 0.71 | — | — | |
| SCHEMBL705323 | 0.71 | LMNA (0.30) | — | |
| SCHEMBL4281435 | 0.71 | — | — | |
| SCHEMBL7997922 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103224510-A | Alkoxyaminosilane compounds and applications thereof | AIR PROD & CHEM | 2013-07-31 | — | — | CN | claimed |
| CN-119998691-A | Antireflection film, liquid composition set, and method for producing antireflection film | 日本板硝子株式会社 | 2025-05-13 | — | — | CN | disclosed |
| CN-117070147-A | Composition for producing film for semiconductor device and method for producing same | 三井化学株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-108352320-B | Film composition for semiconductor, method for producing same, and semiconductor device | 三井化学株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-109423309-B | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display assembly | 奇美实业股份有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-113330078-B | Release layer and product containing release layer | 3M创新有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-113330078-A | Release layer and product containing release layer | 3M创新有限公司 | 2021-08-31 | — | — | CN | disclosed |
| CN-110121799-A | Electrode for secondary battery, and methods for producing them | 株式会社日立制作所 | 2019-08-13 | — | — | CN | disclosed |
| CN-107141313-A | Transparent oxide electrode and its production method that surface modifier, surface for transparent oxide electrode are modified | 信越化学工业株式会社 | 2017-09-08 | — | — | CN | disclosed |
| CN-104812841-B | Curable organosilicon composition, its cured product and optical semiconductor device | 道康宁东丽株式会社 | 2017-08-29 | — | — | CN | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-101472959-A | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECH HOLDINGS CV (NL) | 2009-07-01 | — | — | CN | disclosed |
| CN-101442003-A | Organosilane-containing material for insulation film, method for producing the same, and semiconductor device | TOSOH CORP (JP) | 2009-05-27 | — | — | CN | disclosed |
| CN-100444330-C | Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device | TOSOH CORP (JP) | 2008-12-17 | — | — | CN | disclosed |
| CN-101133364-A | Composition for resist underlayer film and method for producing same | JSR CORP (JP) | 2008-02-27 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-1663473-A2 | MOLECULE ARRAYS AND METHOD FOR PRODUCING THE SAME | Upper Austrian Research GmbH (AT) | 2006-06-07 | — | — | EP | disclosed |
| CN-1717792-A | Material for insulating film containing organosilane and organosiloxane compound, method for producing same, and semiconductor device | TOSOH CORP (JP) | 2006-01-04 | — | — | CN | disclosed |
| WO-2005025737-A2 | MOLECULE ARRAYS AND METHOD FOR PRODUCING THE SAME | UPPER AUSTRIAN RESEARCH GMBH (AT) | 2005-03-24 | — | — | WO | disclosed |