SCHEMBL7068313

SCHEMBL7068313

C1=CC2CCC1C2.CC12CC3CC(C1)CC(C(=O)O)(C3)C2

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
PKM P14618 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
TSHR P16473 1/20 0.39
GAA P10253 2/20 0.37
CYP3A4 P08684 1/20 0.37
KMT2A Q03164 3/20 0.37
MEN1 O00255 2/20 0.36
RBP4 P02753 1/20 0.34
LMNA P02545 3/20 0.33
MAPT P10636 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
HTT P42858 1/20 0.33
THRB P10828 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL301518 0.87 ALDH1A1 (0.51) ALDH1A1PKML3MBTL1TSHRGAA
Hydrochloric Acid SCHEMBL8957771 0.85 PKM (0.53) ALDH1A1PKML3MBTL1TSHRGAA
SCHEMBL20660390 0.76 KMT2A (0.43) ALDH1A1PKML3MBTL1TSHRGAA
SCHEMBL27459840 0.73 GRIN2D (0.32) TSHRLMNA
SCHEMBL164232 0.73 L3MBTL1 (0.58) ALDH1A1PKML3MBTL1GAAKMT2A
SCHEMBL13589980 0.73 L3MBTL1 (0.58) ALDH1A1PKML3MBTL1GAAKMT2A
SCHEMBL14493665 0.73 L3MBTL1 (0.58) ALDH1A1PKML3MBTL1GAAKMT2A
SCHEMBL12970403 0.73 TSHR (0.45) ALDH1A1PKML3MBTL1TSHRGAA
SCHEMBL7452750 0.72 TSHR (0.47) ALDH1A1TSHRGAACYP3A4KMT2A
SCHEMBL8957767 0.72 TSHR (0.51) TSHRGAACYP3A4KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6649714-B2 Metathesis ring opening polymerization of cyclic nonaromatic monomers, in the presence of polymerization catalysts, then hydrogenating without additional hydrogenation catalysts; efficiency SUMITOMO BAKELITE CO., LTD. (JP) 2003-11-18 US disclosed
US-20030195298-A1 Processes for making polymers containing pendant cyclic anhydride groups SUMITOMO BAKELITE CO., LTD. 2003-10-16 US disclosed
EP-1163282-B1 PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS SUMITOMO BAKELITE CO (JP) 2003-05-28 EP disclosed
US-6528598-B1 E Ni(C6F5)2 and E represents a neutral electron donor; (toluene)bis(perfluorophenyl) nickel; SUMITOMO BAKELITE CO., LTD. (JP) 2003-03-04 US disclosed
US-6525153-B1 Photoresists; sensitizing photoacid initiator to longer wavelengths photolithography SUMITOMO BAKELITE CO., LTD. (JP) 2003-02-25 US disclosed
EP-1163282-A1 PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS The B.F. Goodrich Company (US) 2001-12-19 EP disclosed
WO-2000053657-A1 PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS THE B.F. GOODRICH COMPANY (US) 2000-09-14 WO disclosed
WO-2000053658-A1 POLYCYCLIC POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS THE B.F. GOODRICH COMPANY (US) 2000-09-14 WO disclosed