SCHEMBL706900

SCHEMBL706900

CCCCC(=O)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL702888 0.92
Valeric Acid SCHEMBL12504185 0.91 AKR1B1 (0.56)
SCHEMBL27946615 0.90 DGKA (0.61)
SCHEMBL1471088 0.90 DGKA (0.61)
SCHEMBL27940024 0.90 DGKA (0.61)
SCHEMBL992131 0.90 DGKA (0.61)
SCHEMBL8893194 0.90 DGKA (0.61)
SCHEMBL7103487 0.90 DGKA (0.61)
SCHEMBL1980440 0.90 DGKA (0.61)
SCHEMBL7119586 0.90 DGKA (0.61)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2699606-B1 POLYMERS FUNCTIONALIZED WITH A CARBOXYLIC OR THIOCARBOXYLIC ESTER CONTAINING A SILYLATED AMINO GROUP BRIDGESTONE CORP (JP) 2016-09-28 EP claimed
CN-103562237-B By the polymkeric substance of the carboxylicesters containing silylated amino or thiocarboxylic acid ester functional BRIDGESTONE CO.,LTD. (JP) 2016-02-17 CN claimed
EP-2699606-A2 POLYMERS FUNCTIONALIZED WITH A CARBOXYLIC OR THIOCARBOXYLIC ESTER CONTAINING A SILYLATED AMINO GROUP Bridgestone Corporation (JP) 2014-02-26 EP claimed
EP-2483317-B1 FUNCTIONALIZED POLYMERS AND METHODS FOR THEIR MANUFACTURE BRIDGESTONE CORP (JP) 2014-02-26 EP claimed
CN-103562237-A Polymers functionalized with a carboxylic or thiocarboxylic ester containing a silylated amino group BRIDGESTONE CORP 2014-02-05 CN claimed
US-20140018500-A1 Polymers Functionalized With A Carboxylic Or Thiocarboxylic Ester Containing A Silylated Amino Group BRIDGESTONE CORPORATION (JP) 2014-01-16 US claimed
WO-2012135451-A2 POLYMERS FUNCTIONALIZED WITH A CARBOXYLIC OR THIOCARBOXYLIC ESTER CONTAINING A SILYLATED AMINO GROUP BRIDGESTONE CORPORATION (JP) 2012-10-04 WO claimed
CN-102639568-A Functionalized polymers and methods for their manufacture BRIDGESTONE CORP 2012-08-15 CN claimed
EP-2483317-A1 FUNCTIONALIZED POLYMERS AND METHODS FOR THEIR MANUFACTURE Bridgestone Corporation (JP) 2012-08-08 EP claimed
US-20120184677-A1 FUNCTIONALIZED POLYMERS AND METHODS FOR THEIR MANUFACTURE BRIDGESTONE CORPORATION (JP) 2012-07-19 US claimed
WO-2011041534-A1 FUNCTIONALIZED POLYMERS AND METHODS FOR THEIR MANUFACTURE BRIDGESTONE CORPORATION (JP) 2011-04-07 WO claimed
US-20110077325-A1 FUNCTIONALIZED POLYMERS AND METHODS FOR THEIR MANUFACTURE BRIDGESTONE CORPORATION (JP) 2011-03-31 US claimed
CN-111777759-B Catechol compound modified polyether, preparation method thereof and application thereof in improving adhesive strength of adhesive 江苏苏博特新材料股份有限公司 2023-05-05 CN disclosed
EP-2699606-B1 POLYMERS FUNCTIONALIZED WITH A CARBOXYLIC OR THIOCARBOXYLIC ESTER CONTAINING A SILYLATED AMINO GROUP BRIDGESTONE CORP (JP) 2016-09-28 EP disclosed
US-9403919-B2 Polymers functionalized with a carboxylic or thiocarboxylic ester containing a silylated amino group BRIDGESTONE CORPORATION (JP) 2016-08-02 US disclosed
CN-103562237-B By the polymkeric substance of the carboxylicesters containing silylated amino or thiocarboxylic acid ester functional BRIDGESTONE CO.,LTD. (JP) 2016-02-17 CN disclosed
US-20110077325-A1 FUNCTIONALIZED POLYMERS AND METHODS FOR THEIR MANUFACTURE BRIDGESTONE CORPORATION (JP) 2011-03-31 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed