SCHEMBL7069800

SCHEMBL7069800

Cc1cc(C2CCCC2)ccc1O

nearest known ligand 0.56

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ACMSD Q8TDX5 2/20 0.56
QDPR P09417 4/20 0.49
HDAC4 P56524 1/20 0.49
HDAC2 Q92769 1/20 0.49
HDAC8 Q9BY41 1/20 0.49
TP53 P04637 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
ESR1 P03372 4/20 0.43
ESR2 Q92731 4/20 0.43
PDE10A Q9Y233 1/20 0.42
KMO O15229 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10884357 0.98 ACMSD (0.57) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL28458164 0.98 ACMSD (0.57) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL7069626 0.98 ACMSD (0.57) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL10890219 0.98 ACMSD (0.57) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL28454797 0.98 ACMSD (0.57) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL917464 0.98 ACMSD (0.57) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL930211 0.92 QDPR (0.52) ACMSDQDPRTP53TDP1ESR1
Bicarbonate SCHEMBL28343383 0.91 ACMSD (0.64) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL11026644 0.91 ACMSD (0.50) ACMSDQDPRHDAC4HDAC2HDAC8
SCHEMBL3817417 0.85 ESR2 (0.58) QDPRESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108779238-B Polycarbonate resin, method for producing polycarbonate resin, coating liquid, electrophotographic photoreceptor, and electrophotographic apparatus 出光兴产株式会社 2021-10-29 CN claimed
EP-1165652-B1 POLYCARBONATES SIUTABLE FOR USE IN OPTICAL ARTICLES GEN ELECTRIC (US) 2003-12-10 EP claimed
CN-117242145-A Resin composition for coating, polymer, method for producing polymer, coating film, and method for producing coating film 富士胶片株式会社 2023-12-15 CN disclosed
CN-117203294-A Resin composition for coating, polymer, method for producing polymer, coating film, and method for producing coating film 富士胶片株式会社 2023-12-08 CN disclosed
CN-109891326-B Electrophotographic photoreceptor, process cartridge, and image forming apparatus 京瓷办公信息系统株式会社 2022-08-02 CN disclosed
CN-114276531-A Bischloroformate composition and process for producing the same, polycarbonate resin and process for producing the same, electrophotographic photoreceptor and electrophotographic apparatus 出光兴产株式会社 2022-04-05 CN disclosed
CN-108779238-B Polycarbonate resin, method for producing polycarbonate resin, coating liquid, electrophotographic photoreceptor, and electrophotographic apparatus 出光兴产株式会社 2021-10-29 CN disclosed
CN-113412306-A Polyarylate resin composition and molded article using the same 尤尼吉可株式会社 2021-09-17 CN disclosed
CN-108699227-B Polyarylate resin and resin composition thereof 尤尼吉可株式会社 2021-05-14 CN disclosed
CN-112384489-A Method for producing organic compound 尤尼吉可株式会社 2021-02-19 CN disclosed
CN-101624442-B Polycarbonate resin and electrophotographic photoreceptor using the same 出光兴产株式会社 2020-06-30 CN disclosed
CN-102272681-A Polycarbonate resin, coating liquid containing same, and electrophotographic photoreceptor 2011-12-07 CN disclosed
CN-101356581-A Storage media and associated method GEN ELECTRIC (US) 2009-01-28 CN disclosed
CN-100364160-C Polymer electrolyte material, polymer electrolyte part, membrane electrode composite and polymer electrolyte type fuel cell TORAY INDUSTRIES (JP) 2008-01-23 CN disclosed
CN-1568505-A Storage medium for data GEN ELECTRIC (US) 2005-01-19 CN disclosed
CN-1503066-A Electrophotosensitive material 京瓷美达株式会社 2004-06-09 CN disclosed
EP-0347690-B1 PROCESS FOR MANUFACTURING BENZENE DERIVATIVES, AND BENZENE DERIVATIVES BASF Aktiengesellschaft (DE) 1992-10-21 EP disclosed
US-5151548-A Crop protection agents BASF AKTIENGESELLSCHAFT (DE) 1992-09-29 US disclosed
EP-0347690-A2 Process for manufacturing benzene derivatives, and benzene derivatives BASF Aktiengesellschaft (DE) 1989-12-27 EP disclosed
US-4628127-A Heterogeneous catalytic alkylation ETHYL CORPORATION (US) 1986-12-09 US disclosed