SCHEMBL7071002

SCHEMBL7071002

CCOC(OCC)[SiH2]Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2931933 0.73 THRB (0.47)
SCHEMBL4093693 0.71
SCHEMBL4366005 0.71 THRB (0.38)
SCHEMBL56821 0.71 THRB (0.38)
SCHEMBL28367911 0.71 THRB (0.38)
SCHEMBL28731001 0.69 THRB (0.36)
SCHEMBL28980315 0.69 LMNA (0.41)
SCHEMBL9068994 0.69
SCHEMBL2050944 0.69
SCHEMBL15194636 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103203250-B Catalyst for alkoxysilane hydrolysis reactions in semiconductor processes and formulations containing the same 弗萨姆材料美国有限责任公司 2018-01-09 CN claimed
US-9809711-B2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process VERSUM MATERIALS US, LLC (US) 2017-11-07 US claimed
EP-2618364-A2 Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-24 EP claimed
US-20130180215-A1 CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-07-18 US claimed
CN-103203250-A Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process AIR PROD & CHEM 2013-07-17 CN claimed
CN-110358445-B Composition for forming water-repellent film and water-repellent film 信越化学工业株式会社 2022-06-17 CN disclosed
US-11118072-B2 Water repellent film-forming composition and water repellent film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-14 US disclosed
EP-3339311-B1 VOLATILE MONOAMINO-DIALKOXYSILANES AND THEIR USE FOR CREATING SILICON-CONTAINING FILMS VERSUM MAT US LLC (US) 2021-07-21 EP disclosed
EP-3553121-B1 WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM SHINETSU CHEMICAL CO (JP) 2021-06-09 EP disclosed
US-20190315972-A1 WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-17 US disclosed
EP-3553121-A1 WATER REPELLENT FILM-FORMING COMPOSITION AND WATER REPELLENT FILM Shin-Etsu Chemical Co., Ltd. (JP) 2019-10-16 EP disclosed
US-10170297-B2 Compositions and methods using same for flowable oxide deposition VERSUM MATERIALS US, LLC (US) 2019-01-01 US disclosed
EP-0894824-A1 RUBBER COMPOSITION NIPPON ZEON CO., LTD. (JP) 1999-02-03 EP disclosed
EP-0864606-A1 RUBBER COMPOSITION NIPPON ZEON CO., LTD. (JP) 1998-09-16 EP disclosed
EP-0256530-B1 GAS SEPARATION MEMBRANE TORAY INDUSTRIES, INC. (JP) 1991-04-10 EP disclosed
EP-0209104-B1 INTERMETALLIC COMPOUND QUANTUM CHEMICAL CORPORATION (a Virginia corp.) (US) 1990-10-24 EP disclosed
US-4950314-A CROSSLINKED POLYOLEFIN OR POLYARYLENE OXIDE TORAY INDUSTRIES INC. (JP) 1990-08-21 US disclosed
EP-0256530-A2 Gas separation membrane TORAY INDUSTRIES, INC. (JP) 1988-02-24 EP disclosed
EP-0209104-A1 Intermetallic compound QUANTUM CHEMICAL CORPORATION (a Virginia corp.) (US) 1987-01-21 EP disclosed
US-4625000-A SULFONATED WITH SILYL HALOSULFONATE THEN CLEAVAGE OF SILYL GROUP UNION CARBIDE CORPORATION (US) 1986-11-25 US disclosed