SCHEMBL7072972

SCHEMBL7072972

C=C(CCS(=O)(=O)c1ccc(C)cc1)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.56
ALDH1A1 P00352 5/20 0.55
CYP3A4 P08684 1/20 0.55
CYP2C9 P11712 1/20 0.55
CYP2C19 P33261 1/20 0.55
PAX8 Q06710 3/20 0.54
LMNA P02545 2/20 0.54
MAPT P10636 1/20 0.54
TP53 P04637 1/20 0.50
P4HB P07237 1/20 0.50
TSHR P16473 1/20 0.50
MAPK1 P28482 1/20 0.50
HSD17B10 Q99714 1/20 0.50
CA12 O43570 1/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
CA9 Q16790 1/20 0.50
GAA P10253 1/20 0.48
KDM4E B2RXH2 1/20 0.48
POLB P06746 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7075097 0.90 ALDH1A1 (0.61) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL8572063 0.83 ALDH1A1 (0.61) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL7704838 0.82 ALDH1A1 (0.67) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL7868867 0.81 ALDH1A1 (0.65) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL7862237 0.80 KMT2A (0.57) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
Ethylene SCHEMBL9048687 0.79 KMT2A (0.65) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL6911921 0.79 ALDH1A1 (0.69) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL28579307 0.78 KMT2A (0.59) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL7789096 0.78 ALDH1A1 (0.56) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19
SCHEMBL28577968 0.78 RECQL (0.56) KMT2AALDH1A1CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030208018-A1 A copolymer comprising a monomer of tosylethylmethacrylate having high absorbency at the 193 nm wavelength; forming ultrafine patterns during photolithography process HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2003-11-06 US disclosed