SCHEMBL707326

SCHEMBL707326

CC(=O)O[Si](OC(C)=O)(C(C)C)C(C)C

nearest known ligand 0.41

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.41
ALDH1A1 P00352 2/20 0.35
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM1 P11229 1/20 0.31
TBXA2R P21731 1/20 0.31
GALR3 O60755 1/20 0.30
MAPT P10636 1/20 0.30
BLM P54132 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL132213 0.89 TSHR (0.38) TSHRALDH1A1
SCHEMBL1087843 0.79 TSHR (0.31) TSHR
SCHEMBL1087095 0.79 TSHR (0.31) TSHR
SCHEMBL1088246 0.79 TSHR (0.31) TSHR
SCHEMBL509444 0.77 TSHR (0.41) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL475861 0.77 TSHR (0.41) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL476054 0.74 TSHR (0.39) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL3209259 0.74 TSHR (0.35) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL6267833 0.71 TSHR (0.41) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL704223 0.70 TSHR (0.36) TSHRALDH1A1CHRM2CHRM4CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4469418-A1 IMPROVED ARTIFICIAL AGGLOMERATED MATERIAL Cosentino Research & Development, S.L. (ES) 2024-12-04 EP claimed
WO-2023143826-A1 IMPROVED ARTIFICIAL AGGLOMERATED MATERIAL COSENTINO RESEARCH & DEVELOPMENT, S.L. (ES) 2023-08-03 WO claimed
US-20230234888-A1 ARTIFICIAL AGGLOMERATED MATERIAL COSENTINO RESEARCH & DEVELOPMENT, S.L. (ES) 2023-07-27 US claimed
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2021-04-27 US claimed
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VERSUM MATERIALS US, LLC (US) 2019-06-20 US claimed
US-20170256399-A9 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-09-07 US claimed
US-20160365244-A1 High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-12-15 US claimed
US-20130295779-A1 HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS VERSUM MATERIALS US, LLC 2013-11-07 US claimed
EP-2650399-A2 High temperature atomic layer deposition of silicon oxide thin films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-16 EP claimed
EP-1661960-B1 COATING COMPOSITION AND LOW DIELECTRIC SILICEOUS MATERIAL PRODUCED BY USING SAME AZ ELECTRONIC MATERIALS USA (US) 2012-07-25 EP claimed
US-7754003-B2 Coating composition and low dielectric siliceous material produced by using same AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-07-13 US claimed
US-20250188609-A1 SEAM-FREE AND CRACK-FREE DEPOSITION LAM RES CORP (US) 2025-06-12 US disclosed
US-20250038003-A1 LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS LAM RESEARCH CORPORATION (US) 2025-01-30 US disclosed
US-20250014890-A1 CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF LAM RESEARCH CORPORATION 2025-01-09 US disclosed
EP-4469418-A1 IMPROVED ARTIFICIAL AGGLOMERATED MATERIAL Cosentino Research & Development, S.L. (ES) 2024-12-04 EP disclosed
CN-1487567-A Composition for producing low dielectric material �����Ʒ�뻯ѧ��˾ 2004-04-07 CN disclosed
US-20040054102-A1 Olefin polymerization catalyst, catalyst component for olefin polymerization, method of storing these, and process for producing olefin polymer SUNALLOMER LTD. (JP) 2004-03-18 US disclosed
CN-1481394-A Olefin polymerization catalyst, olefin polymerization catalyst component and method for storing the same, and process for producing olefin polymer 胜亚诺盟股份有限公司 2004-03-10 CN disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed
EP-1359166-A1 OLEFIN POLYMERIZATION CATALYST, CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, METHOD OF STORING THESE, AND PROCESS FOR PRODUCING OLEFIN POLYMER Sunallomer Ltd (JP) 2003-11-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250014890-A1 CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF CNTN1, NCDN, SEPTIN6 TSHR 4654/4885ALDH1A1 4069/4885CHRM2 3732/4885
US-20190189431-A1 High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films VIM, CDH1, ALDOA TSHR 4770/4885ALDH1A1 633/4885CHRM2 3982/4885
US-10991571-B2 High temperature atomic layer deposition of silicon oxide thin films VIM, CDH1, ALDOA TSHR 4770/4885ALDH1A1 633/4885CHRM2 3982/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.