SCHEMBL7074067

SCHEMBL7074067

CCOCCOC1CCCCC1

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.47
EPHX2 P34913 1/20 0.40
EPHX1 P07099 1/20 0.34
ALDH1A1 P00352 2/20 0.33
POLB P06746 2/20 0.33
KDM4E B2RXH2 1/20 0.33
TSHR P16473 2/20 0.32
NAAA Q02083 1/20 0.32
HPGD P15428 1/20 0.31
LIPG Q9Y5X9 1/20 0.31
SHBG P04278 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11233022 1.00 NPC1 (0.47) NPC1EPHX2EPHX1ALDH1A1POLB
SCHEMBL1291849 1.00 NPC1 (0.47) NPC1EPHX2EPHX1ALDH1A1POLB
SCHEMBL27888535 0.95 EPHX2 (0.43) NPC1EPHX2EPHX1ALDH1A1TSHR
SCHEMBL27536365 0.93 EPHX2 (0.41) NPC1EPHX2ALDH1A1TSHRLIPG
SCHEMBL27888506 0.91 EPHX2 (0.43) NPC1EPHX2ALDH1A1TSHRLIPG
SCHEMBL12949748 0.89 NPC1 (0.45) NPC1EPHX2EPHX1ALDH1A1POLB
SCHEMBL27888454 0.88 EPHX2 (0.46) NPC1EPHX2ALDH1A1TSHRLIPG
SCHEMBL17421867 0.84 NPC1 (0.45) NPC1EPHX2EPHX1NAAAHPGD
SCHEMBL27967551 0.83 NPC1 (0.44) NPC1EPHX2ALDH1A1TSHRNAAA
SCHEMBL8908829 0.83 EPHX2 (0.38) NPC1EPHX2ALDH1A1TSHRLIPG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305395-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20210286261-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-09-16 US disclosed
EP-1319197-A2 ANTIREFLECTIVE COMPOSITION Shipley Company LLC (US) 2003-06-18 EP disclosed
WO-2002025374-A2 ANTIREFLECTIVE COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 2002-03-28 WO disclosed
WO-2002023274-A2 PHOTORESIST COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 2002-03-21 WO disclosed
US-5414144-A Detergent, solvent, film-forming agent ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1995-05-09 US disclosed
US-4317942-A Odoriferous 2-alkoxyethyl-cycloalkyl-ethers CHEMISCHE WERKE HUELS, AKTIENGESELLSCHAFT (DE) 1982-03-02 US disclosed
EP-0022462-B1 2-ALKOXYETHYL-CYCLOALKYL-ETHERS, COMPOSITIONS CONTAINING THESE, AND THEIR UTILIZATION FOR THE PREPARATION OF ODORANT COMPOSITIONS CHEMISCHE WERKE HÜLS AG (DE) 1981-11-25 EP disclosed
EP-0022462-A1 2-Alkoxyethyl-cycloalkyl-ethers, compositions containing these, and their utilization for the preparation of odorant compositions CHEMISCHE WERKE HÜLS AG (DE) 1981-01-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210286261-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, GAR1, REV1 NPC1 2816/4885EPHX2 1694/4885EPHX1 1910/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.