Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | SCN4A | P35499 | 2/20 | 0.32 |
| ▸ | PPARG | P37231 | 4/20 | 0.32 |
| ▸ | PPARA | Q07869 | 4/20 | 0.32 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.31 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.31 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703809 | 0.80 | SLC6A4 (0.37) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL705985 | 0.80 | SLC6A4 (0.37) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL704154 | 0.78 | SLC6A4 (0.36) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL705261 | 0.77 | KCNA3 (0.35) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL702539 | 0.77 | KCNA3 (0.35) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL6463009 | 0.75 | SLC6A4 (0.43) | SLC6A4LMNAPPARGPPARALTA4H | |
| SCHEMBL4370604 | 0.71 | SLC6A4 (0.39) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL6438883 | 0.71 | ALDH1A1 (0.46) | SLC6A4LMNAPPARGPPARAKCNA3 | |
| SCHEMBL28441426 | 0.71 | SLC6A4 (0.39) | SLC6A4LMNASCN4APPARGPPARA | |
| SCHEMBL11658593 | 0.71 | SLC6A4 (0.39) | SLC6A4LMNASCN4APPARGPPARA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |