SCHEMBL7082181

SCHEMBL7082181

FC(F)(F)COc1cc[c]c2ccccc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC2A1 P11166 2/20 0.39
MEN1 O00255 3/20 0.37
MAPT P10636 3/20 0.37
KMT2A Q03164 3/20 0.37
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 2/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
USP2 O75604 1/20 0.37
HSP90AA1 P07900 1/20 0.37
HSP90AB1 P08238 1/20 0.37
THRB P10828 1/20 0.37
G6PD P11413 1/20 0.37
ALOX15 P16050 1/20 0.37
CASP1 P29466 1/20 0.37
HSD17B10 Q99714 1/20 0.37
HTT P42858 2/20 0.33
ALOX5AP P20292 1/20 0.33
FEN1 P39748 1/20 0.33
SCN9A Q15858 1/20 0.32
GPR3 P46089 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL294840 0.83 GABRP (0.35)
SCHEMBL40509 0.77 ALDH1A1 (0.41) MEN1MAPTKMT2AALDH1A1KDM4E
SCHEMBL5545606 0.77 EPHX2 (0.34) KDM4ESCN9A
SCHEMBL7082180 0.75
SCHEMBL5934194 0.75 MAPT (0.44) MAPTL3MBTL1SLC6A2LMNASMN1; SMN2
SCHEMBL668349 0.75 CNR1 (0.41) MEN1KMT2ASLC6A4TSHR
SCHEMBL15206293 0.73 KDM1A (0.36) SLC6A4TSHR
SCHEMBL7832236 0.73 TLR8 (0.38) SLC2A1MEN1KMT2AALDH1A1KDM4E
SCHEMBL5889015 0.73 CA12 (0.43) MAPTALDH1A1KDM4EL3MBTL1HSD17B10
SCHEMBL668261 0.73 CYP2C9 (0.46) SLC2A1MEN1KMT2AL3MBTL1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030017519-A1 Electrochemical enzyme assay BROWN MARY E (US) 2003-01-23 US claimed
US-10234757-B2 Polymer, making method, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-19 US disclosed
EP-2664633-A1 Polymer, making method, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2013-11-20 EP disclosed
US-20130224659-A1 POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed