Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 9/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.53 |
| ▸ | GLA | P06280 | 1/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | PGAM1 | P18669 | 1/20 | 0.53 |
| ▸ | CASP1 | P29466 | 1/20 | 0.53 |
| ▸ | CASP7 | P55210 | 1/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | MGAM | O43451 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | SI | P14410 | 1/20 | 0.45 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | KDM5A | P29375 | 1/20 | 0.44 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8649540 | 0.87 | MAOA (0.46) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL16243219 | 0.86 | MAOA (0.52) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL30013513 | 0.82 | CYP2C19 (0.51) | MAOAMAPTHPGDNPC1RAB9A | |
| SCHEMBL18242476 | 0.81 | MAOA (0.59) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL8868142 | 0.81 | MAOA (0.46) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL27278131 | 0.77 | NQO1 (0.51) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL18241984 | 0.76 | MAOA (0.52) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL28050221 | 0.76 | MAOA (0.47) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL3130212 | 0.76 | IKBKB (0.61) | MAOAALDH1A1SMN1; SMN2KDM4EGLA | |
| SCHEMBL18407415 | 0.75 | KDM4E (0.53) | MAOAALDH1A1SMN1; SMN2KDM4EGLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117420731-A | Negative photosensitive composition and pattern forming method | 东京应化工业株式会社 | 2024-01-19 | — | — | CN | disclosed |
| WO-2023171023-A1 | ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, CURED PRODUCT, LAMINATE ,AND ARTICLE | DIC株式会社 | 2023-09-14 | — | — | WO | disclosed |
| CN-116018558-A | Negative photosensitive resin composition, pattern forming method and laminated film | 三亚普罗股份有限公司 | 2023-04-25 | — | — | CN | disclosed |
| CN-110352192-B | Heterocyclic compound and harmful arthropod control agent containing same | 住友化学株式会社 | 2023-03-24 | — | — | CN | disclosed |
| CN-109862946-B | Ringing gel composition | 弗门尼舍有限公司 | 2022-02-08 | — | — | CN | disclosed |
| CN-113678062-A | Photosensitive transfer material, method for producing resin pattern, method for producing circuit wiring, and method for producing touch panel | 富士胶片株式会社 | 2021-11-19 | — | — | CN | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| EP-3133445-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL | OSAKA UNIVERSITY (JP) | 2017-02-22 | — | — | EP | disclosed |
| US-20160357103-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| CN-1678252-B | Apparatus for transmitting heat energy, device for providing light in predetermined direction and light emitting device | DAHM JONATHAN S | 2011-06-29 | — | — | CN | disclosed |
| CN-101393395-A | Colored curing resin compound, colored pattern, color filter, method of manufacturing the same | FUJIFILM CORP (JP) | 2009-03-25 | — | — | CN | disclosed |
| CN-101118950-A | Method for manufacturing electronic device, electronic device, and electronic apparatus | SEIKO EPSON CORP (JP) | 2008-02-06 | — | — | CN | disclosed |
| CN-1678252-A | Method and apparatus for curing using light emitting diodes | DAHM JONATHAN S (US) | 2005-10-05 | — | — | CN | disclosed |
| US-20030175615-A1 | Photopolymerization; thermosetting resins | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 2003-09-18 | — | — | US | disclosed |
| EP-1172693-A1 | PHOTOCURABLE RESIN COMPOSITIONS | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2002-01-16 | — | — | EP | disclosed |
| EP-0938413-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES | Kodak Polychrome Graphics (US) | 1999-09-01 | — | — | EP | disclosed |
| WO-1998021038-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES | KODAK POLYCHROME GRAPHICS (US) | 1998-05-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | MAOA 1735/4885ALDH1A1 1963/4885SMN1; SMN2 4562/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | MAOA 3208/4885ALDH1A1 2183/4885SMN1; SMN2 2493/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.