SCHEMBL7089770

SCHEMBL7089770

OCC(Cl)COc1ccc(-c2ccc(OCC(Cl)CO)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.43
TSHR P16473 1/20 0.43
AR P10275 1/20 0.39
LMNA P02545 3/20 0.39
MAPT P10636 2/20 0.39
POLB P06746 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
ALDH1A1 P00352 3/20 0.38
HPGD P15428 1/20 0.38
AAK1 Q2M2I8 2/20 0.37
CYP3A4 P08684 1/20 0.37
MMP2 P08253 2/20 0.36
KDM1A O60341 1/20 0.36
MAOA P21397 1/20 0.36
MAOB P27338 1/20 0.36
MMP3 P08254 1/20 0.36
GAA P10253 1/20 0.36
MAPK1 P28482 1/20 0.36
APP P05067 3/20 0.36
PKM P14618 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7086850 0.94 TSHR (0.47) CYP2C9TSHRARLMNAMAPT
SCHEMBL7089758 0.84 CYP2C9 (0.41) CYP2C9TSHRARLMNAMAPT
SCHEMBL7084185 0.84 CYP2C9 (0.41) CYP2C9TSHRARLMNAMAPT
SCHEMBL7087004 0.84 BACE1 (0.41) CYP2C9TSHRARLMNAMAPT
SCHEMBL7089807 0.82 ABCB11 (0.40) CYP2C9TSHRMAPTPOLBNPSR1
SCHEMBL7089773 0.78 MAPK1 (0.54) TSHRLMNAHPGDGAAMAPK1
SCHEMBL8811629 0.77 AR (0.56) TSHRARLMNAMAPTPOLB
SCHEMBL8901490 0.76 CYP2C9 (0.44) CYP2C9TSHRARLMNAMAPT
SCHEMBL9057992 0.76 AAK1 (0.53) CYP2C9TSHRLMNAMAPTPOLB
SCHEMBL18077410 0.73 AR (0.76) TSHRARLMNAMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030149219-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom BORIACK CLINTON J (US) 2003-08-07 US claimed
US-6534621-B2 Epoxidizing an alpha-halohydrin intermediate produced from an in situ halide substitution-deesterification of an alpha-hydroxy ester derivative DOW GLOBAL TECHNOLOGIES INC. 2003-03-18 US claimed
US-20020045707-A1 Process for manufacturing a hydroxyester derivative intermediate and epoxy resins prepared therefrom DOW GLOBAL TECHNOLOGIES INC. 2002-04-18 US claimed