Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Ether. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL3255637 | 0.89 | MAPK1 (0.44) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Acetic Acid SCHEMBL3249560 | 0.89 | MAPK1 (0.44) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Acetic Acid SCHEMBL113972 | 0.89 | MAPK1 (0.44) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Acetic Acid SCHEMBL2772542 | 0.89 | MAPK1 (0.44) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Ether SCHEMBL2929809 | 0.89 | HSD17B10 (0.54) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Acetic Acid SCHEMBL27775662 | 0.87 | MAPK1 (0.42) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Ethyl Acetate SCHEMBL7090484 | 0.86 | ALDH1A1 (0.52) | HSD17B10TSHRALDH1A1TDP1MAPT | |
| Acetic Acid SCHEMBL60591 | 0.85 | HSD17B10 (0.50) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Ethyl Acetate SCHEMBL5905816 | 0.84 | ALDH1A1 (0.54) | HSD17B10TSHRALDH1A1TDP1MAPK1 | |
| Propylene Glycol SCHEMBL5485962 | 0.83 | TDP1 (0.46) | HSD17B10TSHRALDH1A1TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103298493-B | Method of treating target space, and liquid particles | SUMITOMO CHEMICAL CO | 2015-04-01 | — | — | CN | disclosed |
| US-8967491-B2 | Method of treating target space, and liquid particles | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20130313335-A1 | METHOD OF TREATING TARGET SPACE, AND LIQUID PARTICLES | SUMITOMO CHEMICAL COMPANY, LIMITED | 2013-11-28 | — | — | US | disclosed |
| EP-2658584-A1 | METHOD OF TREATING TARGET SPACE, AND LIQUID PARTICLES | Sumitomo Chemical Company Limited (JP) | 2013-11-06 | — | — | EP | disclosed |
| WO-2012090683-A1 | METHOD OF TREATING TARGET SPACE, AND LIQUID PARTICLES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-05 | — | — | WO | disclosed |
| US-6576397-B2 | Digital infrared laser scanning; computer-to-plate; handling in a bright room; alkali soluble polymer having addition polymerizable unsaturated bonds; initiator; water soluble polyvinyl alcohol overcoat | FUJI PHOTO FILM CO., LTD. (JP) | 2003-06-10 | — | — | US | disclosed |
| US-20010003643-A1 | Precursor, comprising a support having a hydrophilic surface on which a thermal polymerization layer comprising a polymer having addition polymerizable unsaturated bond and a initiator; a water soluble overcoat of polyvinyl alcohol | FUJIFILM CORPORATION (JP) | 2001-06-14 | — | — | US | disclosed |