SCHEMBL7094079

SCHEMBL7094079

C=C(CCCCCNC(=O)Nc1cccc(O)c1)C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MARS1 P56192 1/20 0.53
EPHX1 P07099 7/20 0.51
EPHX2 P34913 2/20 0.50
LMNA P02545 2/20 0.49
ALDH1A1 P00352 3/20 0.49
HTT P42858 2/20 0.49
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
TP53 P04637 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
HDAC1 Q13547 2/20 0.47
HDAC8 Q9BY41 2/20 0.47
HDAC6 Q9UBN7 2/20 0.47
HDAC3 O15379 1/20 0.46
HDAC4 P56524 1/20 0.46
HDAC7 Q8WUI4 1/20 0.46
HDAC2 Q92769 1/20 0.46
HDAC10 Q969S8 1/20 0.46
HDAC11 Q96DB2 1/20 0.46
HDAC9 Q9UKV0 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7094691 0.99 MARS1 (0.54) MARS1EPHX1EPHX2LMNAALDH1A1
SCHEMBL7098401 0.95 MARS1 (0.55) MARS1EPHX1EPHX2LMNAALDH1A1
SCHEMBL7097715 0.90 MARS1 (0.51) MARS1LMNAALDH1A1HTTMEN1
SCHEMBL7096381 0.84 EPHX1 (0.50) EPHX1LMNAALDH1A1HTTKMT2A
SCHEMBL7097155 0.83 LMNA (0.51) EPHX1LMNAALDH1A1HTTKMT2A
SCHEMBL8549833 0.81 EPHX1 (0.60) EPHX1EPHX2LMNAALDH1A1HTT
SCHEMBL7098035 0.81 EPHX2 (0.52) EPHX1EPHX2LMNAALDH1A1HTT
SCHEMBL8599536 0.80 EPHX1 (0.75) MARS1EPHX1EPHX2ALDH1A1HTT
SCHEMBL3157400 0.80 EPHX1 (0.75) MARS1EPHX1EPHX2ALDH1A1HTT
SCHEMBL8601252 0.80 EPHX1 (0.75) MARS1EPHX1EPHX2ALDH1A1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0737896-B1 Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS JP (JP) 2003-08-27 EP disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed