SCHEMBL7097155

SCHEMBL7097155

C=C(CCCCNC(=O)Nc1ccc(O)cc1)C(=O)O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.51
ALDH1A1 P00352 3/20 0.48
EPHX1 P07099 6/20 0.48
HTT P42858 1/20 0.48
MAOA P21397 1/20 0.46
MAOB P27338 1/20 0.46
HDAC1 Q13547 4/20 0.46
HDAC8 Q9BY41 4/20 0.46
HDAC6 Q9UBN7 4/20 0.46
HDAC3 O15379 3/20 0.46
HDAC4 P56524 3/20 0.46
HDAC7 Q8WUI4 3/20 0.46
HDAC2 Q92769 3/20 0.46
HDAC10 Q969S8 3/20 0.46
HDAC11 Q96DB2 3/20 0.46
HDAC9 Q9UKV0 3/20 0.46
HDAC5 Q9UQL6 3/20 0.46
KMT2A Q03164 1/20 0.46
KDM4E B2RXH2 1/20 0.46
RAB9A P51151 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7096381 0.99 EPHX1 (0.50) LMNAALDH1A1EPHX1HTTMAOA
SCHEMBL4942260 0.96 MAOA (0.47) LMNAALDH1A1EPHX1HTTMAOA
SCHEMBL5682291 0.90 MAOA (0.50) LMNAALDH1A1EPHX1HTTMAOA
SCHEMBL7094691 0.84 MARS1 (0.54) LMNAALDH1A1EPHX1HTTKMT2A
SCHEMBL8549833 0.84 EPHX1 (0.60) LMNAALDH1A1EPHX1HTTHDAC1
SCHEMBL8550840 0.83 ALDH1A1 (0.60) LMNAALDH1A1EPHX1HTTKMT2A
SCHEMBL8550250 0.83 EPHX2 (0.50) LMNAALDH1A1EPHX1HTTHDAC1
SCHEMBL7094079 0.83 MARS1 (0.53) LMNAALDH1A1EPHX1HTTHDAC1
SCHEMBL8549863 0.82 GHSR (0.49) LMNAALDH1A1EPHX1HTTHDAC1
SCHEMBL7098367 0.82 EPHX2 (0.50) LMNAALDH1A1EPHX1HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0737896-B1 Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS JP (JP) 2003-08-27 EP disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed