SCHEMBL7096384

SCHEMBL7096384

C=C(CCCCCNC(=O)Nc1ccccc1O)C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 4/20 0.49
HDAC3 O15379 3/20 0.49
MARS1 P56192 1/20 0.49
KMT2A Q03164 2/20 0.46
HDAC8 Q9BY41 3/20 0.45
HDAC6 Q9UBN7 3/20 0.45
HDAC4 P56524 2/20 0.45
HDAC7 Q8WUI4 2/20 0.45
HDAC2 Q92769 2/20 0.45
HDAC10 Q969S8 2/20 0.45
HDAC11 Q96DB2 2/20 0.45
HDAC9 Q9UKV0 2/20 0.45
HDAC5 Q9UQL6 2/20 0.45
LMNA P02545 1/20 0.45
EPHX1 P07099 4/20 0.45
ALDH1A1 P00352 3/20 0.45
HTT P42858 1/20 0.45
ITGB3 P05106 1/20 0.44
ITGAV P06756 1/20 0.44
POLB P06746 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7093746 0.99 MARS1 (0.50) HDAC1HDAC3MARS1KMT2AHDAC8
SCHEMBL7097492 0.95 MARS1 (0.51) HDAC1HDAC3MARS1KMT2ALMNA
SCHEMBL7097365 0.89 ITGB3 (0.51) MARS1KMT2ALMNAEPHX1ALDH1A1
SCHEMBL7099945 0.88 NPY5R (0.45) HDAC1HDAC3KMT2AHDAC8HDAC6
SCHEMBL7097143 0.86 TRPV1 (0.44) MARS1KMT2ALMNAEPHX1ALDH1A1
SCHEMBL7098354 0.86 HDAC1 (0.50) HDAC1HDAC3HDAC8HDAC6HDAC4
SCHEMBL7094061 0.84 HDAC1 (0.51) HDAC1HDAC3HDAC2EPHX1
SCHEMBL13784010 0.83 L3MBTL1 (0.54) HDAC1HDAC3MARS1KMT2AHDAC8
SCHEMBL7097410 0.83 GAA (0.51) HDAC1HDAC3KMT2AEPHX1ALDH1A1
SCHEMBL7097415 0.82 TRPV1 (0.45) MARS1KMT2ALMNAEPHX1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0737896-B1 Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS JP (JP) 2003-08-27 EP disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed