Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 11/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.43 |
| ▸ | HTT | P42858 | 5/20 | 0.43 |
| ▸ | MEN1 | O00255 | 4/20 | 0.43 |
| ▸ | THRB | P10828 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | MMP14 | P50281 | 1/20 | 0.43 |
| ▸ | INSR | P06213 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.42 |
| ▸ | APP | P05067 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.38 |
| ▸ | RAB9A | P51151 | 6/20 | 0.38 |
| ▸ | NPC1 | O15118 | 4/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL7763786 | 0.89 | MAPT (0.47) | MAPTKMT2AHTTMEN1THRB | |
| Hydrochloric Acid SCHEMBL11528454 | 0.79 | MAPT (0.47) | MAPTKMT2AHTTMEN1THRB | |
| SCHEMBL14194559 | 0.76 | MAPT (0.44) | MAPTKMT2AHTTMEN1THRB | |
| SCHEMBL12411252 | 0.70 | NPC1 (0.49) | MAPTKMT2AHTTMEN1LMNA | |
| SCHEMBL11206642 | 0.70 | NPC1 (0.49) | MAPTKMT2AHTTMEN1LMNA | |
| SCHEMBL22189127 | 0.68 | MAPT (0.48) | MAPTKMT2AHTTMEN1THRB | |
| SCHEMBL9841094 | 0.68 | GLO1 (0.50) | MAPTKMT2AMEN1LMNAALDH1A1 | |
| SCHEMBL8080557 | 0.67 | MAPT (0.69) | MAPTKMT2AHTTMEN1THRB | |
| SCHEMBL13046317 | 0.67 | MAPT (0.69) | MAPTKMT2AHTTMEN1THRB | |
| SCHEMBL8080554 | 0.67 | MAPT (0.69) | MAPTKMT2AHTTMEN1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0672953-B1 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | TOPPAN PRINTING CO LTD (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-6045953-A | COMPRISES A SUBSTRATE, A PHOTOSENSITIVE LAYER FORMED ON THE SUBSTRATE BY COATING A PHOTOSENSITIVE SOLUTION CONTAINING AN ALICYCLIC, SOLVENT SOLUBLE, CATIONIC POLYMERIZABLE EPOXY RESIN AND AN ACRYLATE POLYMER | TOPPAN PRINTING CO., LTD. (JP) | 2000-04-04 | — | — | US | disclosed |
| EP-0697631-B1 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | TOPPAN PRINTING CO LTD (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5698345-A | CATIONIC POLYMERIZATION OF THERMOSETTING EPOXY OLIGOMER | TOPPAN PRINTING CO., LTD. (JP) | 1997-12-16 | — | — | US | disclosed |
| EP-0697631-A1 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | Toppan Printing Co., Ltd. (JP) | 1996-02-21 | — | — | EP | disclosed |
| EP-0672953-A2 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | Toppan Printing Co., Ltd. (JP) | 1995-09-20 | — | — | EP | disclosed |