Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.43 |
| ▸ | CTSD | P07339 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | HTR2B | P41595 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | IDO1 | P14902 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16794738 | 0.78 | ALDH1A1 (0.43) | ALDH1A1TDP1HSD17B10CTSDTSHR | |
| SCHEMBL49707 | 0.78 | ALDH1A1 (0.43) | ALDH1A1TDP1HSD17B10CTSDTSHR | |
| SCHEMBL7691374 | 0.76 | ALDH1A1 (0.53) | ALDH1A1TDP1HSD17B10CTSDTSHR | |
| SCHEMBL7689248 | 0.74 | P2RX1 (0.49) | ALDH1A1TSHRMAPTMEN1KMT2A | |
| SCHEMBL11852672 | 0.74 | TSHR (0.42) | ALDH1A1TDP1HSD17B10CTSDTSHR | |
| SCHEMBL2200402 | 0.74 | TSHR (0.42) | ALDH1A1TDP1HSD17B10CTSDTSHR | |
| SCHEMBL7686146 | 0.72 | TSHR (0.35) | TSHRMAPTLMNAMEN1KMT2A | |
| SCHEMBL7686136 | 0.70 | KMT2A (0.41) | ALDH1A1PTGS2MEN1KMT2ARAB9A | |
| SCHEMBL7691868 | 0.69 | POLB (0.38) | ALDH1A1TSHRPTGS2ALOX12SMN1; SMN2 | |
| SCHEMBL2104240 | 0.69 | TSHR (0.41) | ALDH1A1TDP1HSD17B10CTSDTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2673318-B1 | FLAME RETARDANT, THERMOPLASTIC POLYCARBONATE MOLDING COMPOSITIONS | COVESTRO DEUTSCHLAND AG (DE) | 2017-07-05 | — | — | EP | disclosed |
| WO-2015086461-A1 | NITROGEN-CONTAINING COMPOSITE MATERIALS, PRODUCTION AND USE THEREOF | BASF SE (DE) | 2015-06-18 | — | — | WO | disclosed |
| US-20140058025-A1 | FLAME RETARDANT, THERMOPLASTIC POLYCARBONATE MOLDING COMPOSITIONS | BAYER INTELLECTUAL PROPERTY GMBH (DE) | 2014-02-27 | — | — | US | disclosed |
| EP-2673318-A1 | FLAME RETARDANT, THERMOPLASTIC POLYCARBONATE MOLDING COMPOSITIONS | Bayer Intellectual Property GmbH (DE) | 2013-12-18 | — | — | EP | disclosed |
| WO-2012107514-A1 | FLAME RETARDANT, THERMOPLASTIC POLYCARBONATE MOLDING COMPOSITIONS | BAYER MATERIALSCIENCE AG (DE) | 2012-08-16 | — | — | WO | disclosed |
| EP-0832913-B1 | RANDOM SILOXANE COPOLYMER, PROCESS FOR PRODUCTION THEREOF, AND RESIN COMPOSITION CONTAINING THE COPOLYMER | KANEGAFUCHI CHEMICAL IND (JP) | 2003-09-24 | — | — | EP | disclosed |
| US-6407193-B1 | POLYESTERSILOXANE COPOLYMER; RANDOM COPOLYMER | KANEKA CORPORATION (JP) | 2002-06-18 | — | — | US | disclosed |
| US-6103837-A | REACTING AT LEAST ONE POLYCARBONATE AND/OR DICARBONATE OF A DIOL AND, IF NEEDED, AT LEAST ONE DIESTER OF A DICARBOXYLIC ACID WITH AT LEAST ONE SPECIFIED SILICON COMPOUND IN THE PRESENCE OF AN ESTERIFYING OR ESTER EXCHANGE CATALYST | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2000-08-15 | — | — | US | disclosed |
| EP-0857746-A1 | PROCESS FOR THE PREPARATION OF SILOXANE COPOLYMERS AND RESIN COMPOSITIONS CONTAINING THE SILOXANE COPOLYMERS PREPARED BY THE PROCESS | KANEKA CORPORATION (JP) | 1998-08-12 | — | — | EP | disclosed |
| EP-0832913-A1 | RANDOM SILOXANE COPOLYMER, PROCESS FOR PRODUCTION THEREOF, AND RESIN COMPOSITION CONTAINING THE COPOLYMER | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1998-04-01 | — | — | EP | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |
| US-3965096-A | Ultraviolet and thermally stable polymer compositions | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE UNITED STATES NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 1976-06-22 | — | — | US | disclosed |