⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2160443 | 0.88 | — | — | |
| SCHEMBL6854795 | 0.80 | — | — | |
| SCHEMBL6744675 | 0.76 | — | — | |
| SCHEMBL4933561 | 0.76 | EPHX2 (0.32) | — | |
| SCHEMBL7702568 | 0.73 | — | — | |
| SCHEMBL6743573 | 0.73 | — | — | |
| SCHEMBL296303 | 0.72 | — | — | |
| SCHEMBL1518812 | 0.72 | APLNR (0.34) | — | |
| SCHEMBL950832 | 0.68 | GRM4 (0.32) | — | |
| SCHEMBL7644965 | 0.68 | SLC6A4 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124803-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20070027336-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1148396-C | Photoeresist composition comprising polycyclic polymers with acid labile pendant groups | ס�ѵ�ľ��ʽ���� | 2004-05-05 | — | — | CN | disclosed |