SCHEMBL950832

SCHEMBL950832

O=C(O)C1CC2C=CC1(Cl)C2

nearest known ligand 0.32

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GRM4 Q14833 4/20 0.32
CYP2C19 P33261 2/20 0.32
MEN1 O00255 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CYP1A2 P05177 1/20 0.32
KMT2A Q03164 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
GRM8 O00222 1/20 0.32
GRM6 O15303 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
SLC6A4 P31645 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7130933 0.73 SLC6A4 (0.39) GRM4CYP2C19MEN1ALDH1A1CYP1A2
SCHEMBL3173540 0.73 SLC6A4 (0.32) SLC6A4
SCHEMBL1518812 0.73 APLNR (0.34) SLC6A4
SCHEMBL2126599 0.73 SLC6A4 (0.35) GRM4CYP2C19MEN1ALDH1A1CYP1A2
SCHEMBL7644965 0.73 SLC6A4 (0.39) GRM4CYP2C19MEN1ALDH1A1CYP1A2
SCHEMBL11415287 0.73
SCHEMBL8613888 0.72 SLC6A4 (0.31) SLC6A4
SCHEMBL5088721 0.72 MAPT (0.31)
SCHEMBL9802837 0.69
SCHEMBL1206900 0.69 GRM2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240254287-A1 Thiol-ene-based polymerizable composition KARL LEIBINGER ASSET MANAGEMENT GMBH & CO. KG (DE) 2024-08-01 US disclosed
WO-2022243379-A1 THIOL-ENE-BASED POLYMERISABLE COMPOSITION KARL LEIBINGER MEDIZINTECHNIK GMBH & CO. KG (DE) 2022-11-24 WO disclosed
EP-4091599-A1 POLYMERIZABLE THIOL-ENE BASED COMPOSITION Karl Leibinger Medizintechnik Gmbh & Co. Kg (DE) 2022-11-23 EP disclosed
US-8785103-B2 Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2014-07-22 US disclosed
US-20130171563-A1 Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2013-07-04 US disclosed
EP-1829850-B1 Method for the preparation of fluorinated monomers SHINETSU CHEMICAL CO (JP) 2012-05-16 EP disclosed
US-7868199-B2 fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning EUDYNA DEVICES INC. (JP) 2011-01-11 US disclosed
EP-2070901-B1 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2010-12-22 EP disclosed
US-7678530-B2 Lactone-containing compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-16 US disclosed
EP-1457511-B1 CROSSLINKABLE AROMATIC RESINS HAVING PROTONIC ACID GROUPS AND ION CONDUCTIVE POLYMER MEMBRANES BINDERS AND FUEL CELLS MADE BY USING THE SAME MITSUI CHEMICALS INC (JP) 2009-07-15 EP disclosed
EP-0388028-B1 Curable norbornenyl functional silicone formulations LOCTITE CORP (US) 1996-04-10 EP disclosed
EP-0665269-A2 Curable norbornenyl functional silicone formulations LOCTITE CORPORATION (US) 1995-08-02 EP disclosed
US-5266670-A Reaction of norbornene compound with silane and hydrosilation LOCTITE CORPORATION (US) 1993-11-30 US disclosed
US-5171816-A Curable by hydrosilation in presence of polymerization catalyst LOCTITE CORPORATION (US) 1992-12-15 US disclosed
US-5034490-A Silicones with norbornene groups and thiol groups to cure by hydrosilation LOCTITE CORPORATION (US) 1991-07-23 US disclosed
EP-0388005-A2 Selective monohydrosilation of vinyl and ethynyl functional norbornenes and curable products produced thereby LOCTITE CORPORATION (US) 1990-09-19 EP disclosed
EP-0388028-A2 Curable norbornenyl functional silicone formulations LOCTITE CORPORATION (US) 1990-09-19 EP disclosed
US-4440850-A Photopolymerisation process with two exposures of a single layer CIBA-GEIGY CORPORATION (US) 1984-04-03 US disclosed
US-4267174-A AND PROCESS FOR ADMINISTERING BOEHRINGER MANNHEIM, GMBH (DE) 1981-05-12 US disclosed
US-4134811-A Halogenated photopolymerizable compositions UCB, SOCIETE ANONYME (BE) 1979-01-16 US disclosed