SCHEMBL7114243

SCHEMBL7114243

Cc1ccc(C(SC(c2ccccc2)c2ccc(C)cc2)c2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.48
TSHR P16473 2/20 0.48
ACHE P22303 2/20 0.48
ALOX12 P18054 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.46
CYP2D6 P10635 2/20 0.41
MAPK1 P28482 1/20 0.41
HPGD P15428 1/20 0.41
CHRNA7 P36544 1/20 0.41
TDP1 Q9NUW8 3/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
SLC6A4 P31645 1/20 0.40
CYP2C19 P33261 1/20 0.40
SLC6A3 Q01959 1/20 0.40
CNR1 P21554 1/20 0.40
CNR2 P34972 1/20 0.40
OPRM1 P35372 2/20 0.39
OPRD1 P41143 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL776890 0.87 TSHR (0.48) TSHRCYP2D6TDP1CYP1A2CYP3A4
SCHEMBL28543573 0.82 ACP3 (0.49) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL10743810 0.79 LMNA (0.42) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL60997 0.79 LMNA (0.53) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL17923689 0.79 LMNA (0.53) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL12199145 0.79 LMNA (0.53) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL3657920 0.79 LMNA (0.53) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL28527678 0.79 CYP2A6 (0.54) TSHRSMN1; SMN2CYP2D6HPGDTDP1
Hydrochloric Acid SCHEMBL875165 0.78 LMNA (0.48) LMNATSHRACHEALOX12SMN1; SMN2
SCHEMBL575721 0.78 SLC6A3 (0.42) LMNATSHRSMN1; SMN2CYP2D6HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0794218-B1 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENG PLASTICS CORP (JP) 2003-10-15 EP disclosed
US-6040367-A EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2000-03-21 US disclosed
US-5948838-A 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) 1999-09-07 US disclosed
EP-0794218-A2 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 1997-09-10 EP disclosed
US-4656290-A Process for preparing thio, dithio or carbonyl compounds CHINOIN GYOGYSZER ES VEGYESZETI TERMEKEK GYARA RT. (HU) 1987-04-07 US disclosed