SCHEMBL7118930

SCHEMBL7118930

Cc1c(O)c(N=C=O)c(N=C=O)c(C)c1C(C)(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL112221 0.70 CYP3A4 (0.42) CYP3A4
SCHEMBL28795111 0.70 CYP3A4 (0.42) CYP3A4
SCHEMBL29775281 0.69 CYP3A4 (0.41) CYP3A4
SCHEMBL29068318 0.67 GABRA1 (0.36) CYP3A4
SCHEMBL8106600 0.67 CA2 (0.36)
SCHEMBL2814949 0.67 CYP3A4 (0.44) CYP3A4
SCHEMBL28258617 0.67 CYP3A4 (0.37) CYP3A4
SCHEMBL10578932 0.65
SCHEMBL2835593 0.65 CYP3A4 (0.46) CYP3A4
SCHEMBL11060842 0.65 GABRA1 (0.37) CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6592700-B2 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-07-15 US claimed
US-20030039758-A1 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-02-27 US claimed
US-6592700-B2 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-07-15 US disclosed
US-20030039758-A1 Method of producing retro-reflective sheet with high abrasion resistance SAN FANG CHEMICAL INDUSTRY CO., LTD. (TW) 2003-02-27 US disclosed