SCHEMBL711959

SCHEMBL711959

O=C(OC(=O)C(F)(C(F)(F)F)C(F)(F)F)C(F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25238225 0.81 THRB (0.42)
SCHEMBL6008604 0.79 THRB (0.36)
SCHEMBL6009963 0.77 THRB (0.34)
SCHEMBL6009853 0.75 THRB (0.38)
SCHEMBL226310 0.75 ALDH1A1 (0.42)
SCHEMBL153663 0.73 THRB (0.33)
SCHEMBL5915197 0.73
SCHEMBL52 0.72 CA2 (0.35)
SCHEMBL27623481 0.72 CA2 (0.35)
SCHEMBL31253458 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110642750-A Preparation method of perfluoroalkyl nitrile 三明市海斯福化工有限责任公司 2020-01-03 CN claimed
WO-2024104450-A1 METHOD FOR PREPARING HEPTAFLUOROISOBUTYRONITRILE BY GAS-PHASE CATALYSIS 浙江省化工研究院有限公司 2024-05-23 WO disclosed
CN-118056809-A Method for preparing heptafluoroisobutyronitrile by gas phase catalysis 浙江省化工研究院有限公司 2024-05-21 CN disclosed
CN-118056810-A Method for preparing heptafluoroisobutyronitrile by liquid phase catalysis 浙江省化工研究院有限公司 2024-05-21 CN disclosed
CN-118056811-A Method for preparing fluorine-containing nitrile compound by dehydrating amide compound 浙江省化工研究院有限公司 2024-05-21 CN disclosed
CN-117776972-A Method for synthesizing heptafluoroisobutyronitrile 昊华气体有限公司 2024-03-29 CN disclosed
CN-110642750-A Preparation method of perfluoroalkyl nitrile 三明市海斯福化工有限责任公司 2020-01-03 CN disclosed
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9563124-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-07 US disclosed
US-9291893-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-22 US disclosed
US-20140030654-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-01-30 US disclosed
US-8574811-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 US disclosed
US-20120156620-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-06-21 US disclosed
US-20120100483-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-26 US disclosed
US-20120052443-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-01 US disclosed
US-4255594-A Hydrogenation of halogen-containing carboxylic anhydrides ALLIED CHEMICAL CORPORATION (US) 1981-03-10 US disclosed