SCHEMBL712058

SCHEMBL712058

CCOc1cccc([SiH2]c2ccc([SiH2]c3cccc(OCC)c3OCC)cc2)c1OCC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.40
▸ CHRM2 P08172 2/20 0.39
▸ ALOX15 P16050 2/20 0.39
▸ LMNA P02545 2/20 0.39
▸ CHRM1 P11229 1/20 0.39
▸ TSHR P16473 1/20 0.39
▸ ACHE P22303 1/20 0.39
▸ KCNH2 Q12809 1/20 0.39
▸ HIF1A Q16665 1/20 0.39
▸ L3MBTL1 Q9Y468 6/20 0.37
▸ HTR1A P08908 1/20 0.36
▸ ADRA1D P25100 1/20 0.36
▸ ADRA1A P35348 1/20 0.36
▸ ADRA1B P35368 1/20 0.36
▸ MAPT P10636 3/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ GLA P06280 1/20 0.36
▸ KDM4E B2RXH2 3/20 0.35
▸ MEN1 O00255 2/20 0.35
▸ KMT2A Q03164 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706125 0.83 CHRM2 (0.47) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL702281 0.81 CHRM2 (0.46) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL646941 0.80 ALDH1A1 (0.41) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL707161 0.80 ALDH1A1 (0.41) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL28754933 0.80 ALDH1A1 (0.41) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL2068454 0.78 ALDH1A1 (0.54) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL8465535 0.78 ALDH1A1 (0.38) ALDH1A1LMNAL3MBTL1HTR1AADRA1D
SCHEMBL707985 0.77 ALDH1A1 (0.39) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL7806968 0.77 ALDH1A1 (0.39) ALDH1A1CHRM2ALOX15LMNACHRM1
SCHEMBL647737 0.77 ALDH1A1 (0.39) ALDH1A1CHRM2ALOX15LMNACHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 — — US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 — — US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 — — US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 — — US disclosed
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