Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 7/20 | 0.38 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707985 | 0.97 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL707161 | 0.93 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL9176210 | 0.92 | ALDH1A1 (0.40) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL11350174 | 0.92 | L3MBTL1 (0.37) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL7806968 | 0.90 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL9165721 | 0.89 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL7128422 | 0.87 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL21066803 | 0.87 | ALDH1A1 (0.37) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL28754933 | 0.86 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL646941 | 0.86 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10474032-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-12 | — | — | US | disclosed |
| US-9437431-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-06 | — | — | US | disclosed |
| EP-1720075-B1 | Coating compositions | ROHM & HAAS ELECT MAT (US) | 2016-03-02 | — | — | EP | disclosed |
| US-20150072290-A1 | COATING COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-03-12 | — | — | US | disclosed |
| US-8911927-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-12-16 | — | — | US | disclosed |
| US-8889344-B2 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-11-18 | — | — | US | disclosed |
| US-8450045-B2 | Pattern forming method | JSR CORPORATION (JP) | 2013-05-28 | — | — | US | disclosed |
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-20120122036-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2012-05-17 | — | — | US | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20030008244-A1 | Porous optical materials | SHIPLEY COMPANY, L.L.C. (US) | 2003-01-09 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1265080-A2 | Porous optical materials | Shipley Company LLC (US) | 2002-12-11 | — | — | EP | disclosed |
| US-6376634-B1 | ORGANOSILICON POLYMERS | JSR CORPORATION (JP) | 2002-04-23 | — | — | US | disclosed |
| US-20010018129-A1 | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1122770-A2 | Silica-based insulating film and its manufacture | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1058274-A1 | Composition for film formation and material for insulating film formation | JSR Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |