Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 6/20 | 0.38 |
| ▸ | HTR1A | P08908 | 1/20 | 0.37 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.37 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.37 |
| ▸ | ADRA1B | P35368 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL647737 | 0.93 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL707985 | 0.93 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL7806968 | 0.93 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL7128422 | 0.90 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL21066803 | 0.90 | ALDH1A1 (0.37) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL28754933 | 0.89 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL646941 | 0.89 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL9176210 | 0.89 | ALDH1A1 (0.40) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL11350174 | 0.89 | L3MBTL1 (0.37) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A | |
| SCHEMBL9165721 | 0.86 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1HTR1AADRA1DADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8283260-B2 | Process for restoring dielectric properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-09 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100041234-A1 | Process For Restoring Dielectric Properties | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20090298671-A1 | Compositions for Preparing Low Dielectric Materials Containing Solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-12-03 | — | — | US | disclosed |
| US-7500397-B2 | Activated chemical process for enhancing material properties of dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-03-10 | — | — | US | disclosed |
| US-7482676-B2 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-01-27 | — | — | US | disclosed |
| US-20080264672-A1 | Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |
| US-20080199977-A1 | Activated Chemical Process for Enhancing Material Properties of Dielectric Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-21 | — | — | US | disclosed |
| US-20060183055-A1 | Method for defining a feature on a substrate | VERSUM MATERIALS US, LLC | 2006-08-17 | — | — | US | disclosed |
| EP-1691410-A2 | Method for defining a feature on a substrate | Air Products and Chemicals, Inc. (US) | 2006-08-16 | — | — | EP | disclosed |
| EP-1583141-A2 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-10-05 | — | — | EP | disclosed |
| EP-1577935-A2 | Compositions for preparing low dielectric materials containing solvents | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-09-21 | — | — | EP | disclosed |
| US-20050196974-A1 | Compositions for preparing low dielectric materials containing solvents | VERSUM MATERIALS US, LLC | 2005-09-08 | — | — | US | disclosed |
| US-20050196535-A1 | Solvents and methods using same for removing silicon-containing residues from a substrate | AIR PRODUCTS AND CHEMICALS, INC. | 2005-09-08 | — | — | US | disclosed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| US-20040048960-A1 | Compositions for preparing low dielectric materials | AIR PRODUCTS AND CHEMICALS, INC. | 2004-03-11 | — | — | US | disclosed |
| EP-1376671-A1 | Compositions for preparing materials with a low dielectric constant | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |