SCHEMBL7120619

SCHEMBL7120619

CCCO[Si](C)(CCc1cccc(N)c1)OCCC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 3/20 0.46
MAOA P21397 2/20 0.46
CYP19A1 P11511 1/20 0.45
TSHR P16473 1/20 0.39
TP53 P04637 2/20 0.37
CYP3A4 P08684 1/20 0.37
ABHD6 Q9BV23 1/20 0.36
MAPT P10636 3/20 0.36
SIGMAR1 Q99720 2/20 0.35
HTT P42858 2/20 0.35
LMNA P02545 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
KDM4E B2RXH2 1/20 0.34
MEN1 O00255 1/20 0.34
USP2 O75604 1/20 0.34
ALDH1A1 P00352 1/20 0.34
POLB P06746 1/20 0.34
GAA P10253 1/20 0.34
CASP1 P29466 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8953986 0.84 MAOB (0.41) MAOBMAOACYP19A1TSHRTP53
SCHEMBL8364533 0.80 MAOB (0.49) MAOBMAOACYP19A1TSHRTP53
SCHEMBL8955737 0.78 ABHD6 (0.41) MAOBMAOACYP19A1TSHRTP53
SCHEMBL8953981 0.76 MAOB (0.42) MAOBMAOACYP19A1TSHRTP53
SCHEMBL379137 0.74 MAOA (0.65) MAOBMAOACYP19A1TSHRTP53
SCHEMBL29403245 0.74 MAOA (0.65) MAOBMAOACYP19A1TSHRTP53
SCHEMBL3847130 0.74 MAOB (0.47) MAOBMAOACYP19A1TP53CYP3A4
Hydrochloric Acid SCHEMBL2423772 0.73 MAOA (0.67) MAOBMAOACYP19A1TSHRTP53
SCHEMBL10613275 0.72 MAOB (0.53) MAOBMAOACYP19A1CYP3A4ABHD6
SCHEMBL27942470 0.72 LOXL2 (0.39) TSHRCYP3A4HTTLMNARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6664021-B1 Acid generator and silicon-containing polyimide ester precursor comprising partially esterified silicon-containing polyamic ester; radiating with light CHISSO CORPORATION (JP) 2003-12-16 US disclosed
US-5449705-A Silicon-containing polyamic acid derivative and photosensitive resin composition using it CHISSO CORPORATION (JP) 1995-09-12 US disclosed
US-5449588-A Shrinkage inhibition CHISSO CORPORATION (JP) 1995-09-12 US disclosed