Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL712411 | 1.00 | ALDH1A1 (0.35) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL909592 | 0.82 | ALDH1A1 (0.40) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL909593 | 0.82 | ALDH1A1 (0.40) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL31239136 | 0.81 | — | — | |
| SCHEMBL3190725 | 0.80 | CNR2 (0.35) | ALDH1A1MEN1KMT2AHPGDHSD17B10 | |
| SCHEMBL28342699 | 0.79 | CPA1 (0.35) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL196534 | 0.76 | IDH1 (0.40) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL28046024 | 0.74 | KMT2A (0.48) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL28277948 | 0.71 | ALDH1A1 (0.55) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A | |
| SCHEMBL3644804 | 0.71 | KMT2A (0.40) | ALDH1A1CYP2D6CYP2C9CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 270 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| CN-113930151-A | Anti-reflective coating composition containing self-crosslinkable mercaptomelamine polymer, preparation method thereof and pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2022-01-14 | — | — | CN | claimed |
| US-8906286-B2 | Intraluminal prostheses having polymeric material with selectively modified crystallinity and methods of making same | SYNECOR, LLC (US) | 2014-12-09 | — | — | US | claimed |
| EP-1601524-B1 | INTRALUMINAL PROSTHESES WITH ANNEALED POLYMER COATING | SYNECOR LLC (US) | 2014-11-19 | — | — | EP | claimed |
| EP-1637928-B1 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2012-05-02 | — | — | EP | claimed |
| JP-4836779-B2 | — | — | 2011-12-14 | — | — | JP | claimed |
| US-7994050-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2011-08-09 | — | — | US | claimed |
| US-20110169198-A1 | Intraluminal Prostheses Having Polymeric Material with Selectively Modified Crystallinity and Methods of Making Same | DESIMONE JOSEPH M | 2011-07-14 | — | — | US | claimed |
| US-20100311239-A1 | Method for forming dual damascene pattern | LEE KI LYOUNG | 2010-12-09 | — | — | US | claimed |
| EP-1736828-B1 | Photoresist monomer, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2010-11-24 | — | — | EP | claimed |
| US-20030091927-A1 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | HYNIX SEMICONDUCTOR INC. (KR) | 2003-05-15 | — | — | US | claimed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030022100-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030013036-A1 | Photoresist polymer and composition having nitro groups | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-16 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-6455226-B1 | POLYMER FORMED BY POLYMERIZING MIXTURE OF NORBORNYLENE AND MALEIC ANHYDRIDE DERIVATIVE, REDUCING POLYMER WITH REDUCING AGENT, REACTING WITH HYDROXY PROTECTING GROUP PRECURSOR | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-09-24 | — | — | US | claimed |
| US-20020081504-A1 | Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2002-06-27 | — | — | US | claimed |
| US-20020061466-A1 | Photoresist monomer, polymer thereof and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-05-23 | — | — | US | claimed |
| US-20020031721-A1 | Photoresist composition for top-surface imaging processes by silylation | HYNIX SEMICONDUCTOR INC. (KR) | 2002-03-14 | — | — | US | claimed |
| US-20020018960-A1 | Novel photoresist polymers, and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2002-02-14 | — | — | US | claimed |