Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | IDH1 | O75874 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 4/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | NQO1 | P15559 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL909592 | 1.00 | ALDH1A1 (0.40) | ALDH1A1TSHRTDP1CYP3A4LMNA | |
| SCHEMBL196534 | 0.89 | IDH1 (0.40) | ALDH1A1TSHRTDP1CYP3A4LMNA | |
| SCHEMBL10560084 | 0.88 | LMNA (0.39) | ALDH1A1TSHRTDP1CYP3A4LMNA | |
| SCHEMBL3190748 | 0.86 | PKM (0.39) | ALDH1A1TSHRTDP1CYP3A4LMNA | |
| SCHEMBL6517535 | 0.83 | TSHR (0.38) | ALDH1A1TSHRTDP1CYP3A4LMNA | |
| SCHEMBL712410 | 0.82 | ALDH1A1 (0.35) | ALDH1A1CYP3A4HTTMEN1KMT2A | |
| SCHEMBL712411 | 0.82 | ALDH1A1 (0.35) | ALDH1A1CYP3A4HTTMEN1KMT2A | |
| SCHEMBL4838484 | 0.76 | ALDH1A1 (0.49) | ALDH1A1TSHRTDP1CYP3A4KMT2A | |
| SCHEMBL28046024 | 0.76 | KMT2A (0.48) | ALDH1A1CYP3A4LMNAHTTMEN1 | |
| SCHEMBL6535739 | 0.76 | ALDH1A1 (0.48) | ALDH1A1TSHRTDP1CYP3A4MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024006254-A2 | TRI-CURE HYBRID ORGANO-SILICON COATINGS | BOWLING GREEN STATE UNIVERSITY (US) | 2024-01-04 | — | — | WO | claimed |
| EP-2493991-B1 | ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS | MERCK PATENT GMBH (DE) | 2016-03-02 | — | — | EP | claimed |
| EP-2052293-B1 | ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA (US) | 2013-03-13 | — | — | EP | claimed |
| EP-1563343-B1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-01-11 | — | — | EP | claimed |
| EP-1131678-B1 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | AZ ELECTRONIC MATERIALS USA (US) | 2009-07-08 | — | — | EP | claimed |
| EP-1046958-B1 | USE OF A COMPOSITION FOR BOTTOM REFLECTION PREVENTIVE FILM | AZ ELECTRONIC MATERIALS USA (US) | 2006-04-12 | — | — | EP | claimed |
| EP-0708934-B1 | RADIATION-SENSITIVE PAINT COMPOSITION | SIEMENS AG (DE) | 1998-10-21 | — | — | EP | claimed |
| US-5648195-A | Radiation-sensitive resist composition comprising a diazoketone | SIEMENS AKTIENGESELLSCHAFT (DE) | 1997-07-15 | — | — | US | claimed |
| CN-122072436-A | Negative photosensitive resin composition, cured film, and resist film | DIC株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-12625428-B2 | Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-12 | — | — | US | disclosed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-03-19 | — | — | US | disclosed |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-12449732-B2 | Composition for forming resist underlayer film with improved film density | NISSAN CHEMICAL CORPORATION (JP) | 2025-10-21 | — | — | US | disclosed |
| EP-0510441-A1 | Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-10-28 | — | — | EP | disclosed |
| EP-0501308-A1 | Radiation-sensitive polymers with naphthoquinone-2-diazid-4-sulfonyl group and its use in a positive-working recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-02 | — | — | EP | disclosed |
| EP-0501294-A1 | Radiation-sensitive polymers with 2-diazo-1,3-dicarbonyl groups, process for its production and its use in a positive-working recording material | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-09-02 | — | — | EP | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417556-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |
| EP-0417557-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | EEF1D, RHOA, YWHAH | ALDH1A1 4238/4885TSHR 4527/4885TDP1 1278/4885 |
| US-20260042932-A1 | COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD | SMCHD1, PIM1, PIM2 | ALDH1A1 4758/4885TSHR 4809/4885TDP1 4130/4885 |
| US-12625428-B2 | Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms | SEM1, CDH1, EEF1D | ALDH1A1 520/4885TSHR 4800/4885TDP1 3614/4885 |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | BHMT, AADAT, PNMT | ALDH1A1 1396/4885TSHR 2780/4885TDP1 70/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.