Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.44 |
| ▸ | P2RX7 | Q99572 | 2/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | BPTF | Q12830 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17845447 | 0.84 | GAA (0.43) | ALDH1A1 | |
| SCHEMBL28056616 | 0.84 | ALDH1A1 (0.46) | ALDH1A1SMN1; SMN2P2RX7NPSR1BPTF | |
| SCHEMBL3828262 | 0.83 | ALDH1A1 (0.44) | ALDH1A1SMN1; SMN2EPHX2P2RX7NPSR1 | |
| SCHEMBL14973422 | 0.81 | SMN1; SMN2 (0.45) | ALDH1A1SMN1; SMN2EPHX2P2RX7NPSR1 | |
| SCHEMBL17695152 | 0.80 | EPHX2 (0.44) | ALDH1A1EPHX2HSD17B10 | |
| SCHEMBL6536554 | 0.78 | ALDH1A1 (0.41) | ALDH1A1SMN1; SMN2EPHX2P2RX7NPSR1 | |
| SCHEMBL17746546 | 0.78 | ALDH1A1 (0.35) | ALDH1A1SMN1; SMN2EPHX2P2RX7 | |
| SCHEMBL2747445 | 0.77 | ALDH1A1 (0.60) | ALDH1A1SMN1; SMN2EPHX2NPSR1HSD17B10 | |
| SCHEMBL704030 | 0.77 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2EPHX2P2RX7NPSR1 | |
| SCHEMBL38655452 | 0.76 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2P2RX7BPTFLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6664022-B1 | Forming relief image on substrate by coating with amplified positive resin and iodinium or sulfonium compound comprising naphthyl, thienyl or pentafluorophenyl substituents; exposure to patterned activating radiation; development | SHIPLEY COMPANY, L.L.C. | 2003-12-16 | — | — | US | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |