SCHEMBL712650

SCHEMBL712650

CCC12OCC(CO)(CO1)CO2

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4543694 0.81
SCHEMBL9413237 0.80 EPHX1 (0.33) EPHX1
SCHEMBL40172 0.74 EPHX1 (0.42) EPHX1
SCHEMBL9265531 0.71 EPHX1 (0.31) EPHX1
SCHEMBL16317803 0.71
SCHEMBL12513995 0.70
SCHEMBL17627917 0.68
SCHEMBL10254966 0.67 EPHX1 (0.46) EPHX1
SCHEMBL9263838 0.65
SCHEMBL7388302 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0671429-B1 Dense star polymers and a process for producing dense star polymers DOW CHEMICAL CO (US) 1999-05-06 EP claimed
EP-0115771-B1 Dense star polymers and a process for producing dense star polymers DOW CHEMICAL CO (US) 1995-03-01 EP claimed
US-5354495-A Homo- or copolymerizable through ethylenic unsaturation NIPPON PAINT CO., LTD. (JP) 1994-10-11 US claimed
EP-0177122-B1 ACRYLAMIDE DERIVATIVES Nippon Paint Co., Ltd. (JP) 1992-04-01 EP claimed
US-4935413-A ELASTICITY, ADHESION AND DISPERSIBILITY NIPPON PAINT CO., LTD. (JP) 1990-06-19 US claimed
US-4425473-A 2,6,7-TRIOXABICYCLO(2.2.2)OCTANES, VOLUME EXPANSION, NONSHRINKING TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1984-01-10 US claimed
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
US-20260092142-A1 RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR TORAY INDUSTRIES, INC. (JP) 2026-04-02 US disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
US-12545784-B2 Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device TORAY INDUSTRIES, INC. (JP) 2026-02-10 US disclosed
EP-4668018-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE Toray Industries, Inc. (JP) 2025-12-24 EP disclosed
US-12461444-B2 Sulfonium salt, photoacid generator, curable composition, and resist composition SAN-APRO LTD. (JP) 2025-11-04 US disclosed
WO-2025126939-A1 PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, SCINTILLATOR PANEL USING SAME, AND SEMICONDUCTOR DEVICE 東レ株式会社 2025-06-19 WO disclosed
EP-0177122-A2 Acrylamide derivatives Nippon Paint Co., Ltd. (JP) 1986-04-09 EP disclosed
US-4568737-A Dense star polymers and dendrimers THE DOW CHEMICAL COMPANY (US) 1986-02-04 US disclosed
US-4558120-A Dense star polymer THE DOW CHEMICAL COMPANY (US) 1985-12-10 US disclosed
EP-0115771-A2 Dense star polymers and a process for producing dense star polymers THE DOW CHEMICAL COMPANY (US) 1984-08-15 EP disclosed
WO-1984002705-A1 DENSE STAR POLYMERS AND A PROCESS FOR PRODUCING DENSE STAR POLYMERS DOW CHEMICAL CO (US) 1984-07-19 WO disclosed
US-4425473-A 2,6,7-TRIOXABICYCLO(2.2.2)OCTANES, VOLUME EXPANSION, NONSHRINKING TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1984-01-10 US disclosed
US-4338240-A Curable material and process for production thereof TOAGOESI CHEMICAL INDUSTRY CO., LTD. (JP) 1982-07-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12545784-B2 Resin composition, resin composition film, cured film, hollow structure using same, and semiconductor device ASIC1, ASIC3, TET3 EPHX1 1303/4885
US-20260092142-A1 RESIN COMPOSITION, CURED PRODUCT, SCINTILLATOR PANEL, AND INDUCTOR PTGER1, RPTOR, LCP1 EPHX1 2313/4885
US-12461444-B2 Sulfonium salt, photoacid generator, curable composition, and resist composition TIPRL, SPIN1, SPIN2B EPHX1 825/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.