Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TYMS | P04818 | 7/20 | 0.74 |
| ▸ | CRHBP | P24387 | 1/20 | 0.56 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.56 |
| ▸ | PARP1 | P09874 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.45 |
| ▸ | CES2 | O00748 | 1/20 | 0.45 |
| ▸ | BCHE | P06276 | 1/20 | 0.45 |
| ▸ | CES1 | P23141 | 1/20 | 0.45 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.39 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
| ▸ | CASP7 | P55210 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17263918 | 0.78 | ALDH1A1 (0.50) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL29518254 | 0.78 | ALDH1A1 (0.50) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL19976612 | 0.77 | TYMS (0.53) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL15847664 | 0.76 | TYMS (0.52) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL7119781 | 0.76 | TYMS (0.52) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL10440496 | 0.76 | TYMS (0.52) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL22590221 | 0.75 | TYMS (0.51) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL15288764 | 0.74 | TYMS (0.46) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL31395712 | 0.73 | ALDH1A1 (0.50) | TYMSCRHBPCRHR2PARP1ALDH1A1 | |
| SCHEMBL25301053 | 0.73 | TYMS (0.49) | TYMSPARP1ALDH1A1CYP3A4PABPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11709429-B2 | Composition for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-20230168585-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-01 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11256170-B2 | Compound, resist composition, and method for forming resist pattern using it | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-22 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| US-11143962-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-10-12 | — | — | US | disclosed |
| US-11137686-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-10-05 | — | — | US | disclosed |
| US-20130143158-A1 | Photosensitive Resin Composition for Color Filter and Color Filter Including the Same | CHEIL INDUSTRIES INC. (KR) | 2013-06-06 | — | — | US | disclosed |
| US-20130143158-A1 | Photosensitive Resin Composition for Color Filter and Color Filter Including the Same | CHEIL INDUSTRIES INC. (KR) | 2013-06-06 | — | — | US | disclosed |
| US-20100104842-A1 | ORGANIC-INORGANIC HYBRID COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20100104842-A1 | ORGANIC-INORGANIC HYBRID COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| WO-2008120811-A1 | ORGANIC - INORGANIC HYBRID COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | WO | disclosed |
| WO-2008047992-A1 | RESIN COMPOSITION COMPRISING CARDO RESIN, METHOD FOR FORMING PATTERN USING THE RESIN COMPOSITION AND COLOR FILTER USING PATTERN FORMED BY THE METHOD | CHEIL INDUSTRIES INC. (KR) | 2008-04-24 | — | — | WO | disclosed |
| US-6667303-B1 | Agonists for serotonin 5-hydroxytryptamine 2C(5HT2C) receptor; 6-(1,4-diazepan-1-yl)benzo(cd)indol-2(1H)-ones, 6-(1,4-diazepan-1-yl)acenaphthylen-1(2H)-ones, and 5-(1,4-diazepan-1-yl)- 2H-naphtho(1,8-cd)isothiazole-1,1-dioxides | WYETH | 2003-12-23 | — | — | US | disclosed |
| US-5369084-A | Isonicotinic acid derivatives and related spiro compounds with herbicidal action | JANSSEN PHARMACEUTICAL N.V. (BE) | 1994-11-29 | — | — | US | disclosed |
| EP-0558521-A1 | ISONICOTINIC ACID DERIVATIVES AND RELATED SPIRO COMPOUNDS WITH HERBICIDAL ACTION | JANSSEN PHARMACEUTICA N.V. (BE) | 1993-09-08 | — | — | EP | disclosed |
| WO-1992009577-A1 | ISONICOTINIC ACID DERIVATIVES AND RELATED SPIRO COMPOUNDS WITH HERBICIDAL ACTION | JANSSEN PHARMACEUTICA N.V. (BE) | 1992-06-11 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11256170-B2 | Compound, resist composition, and method for forming resist pattern using it | RDX, SLC11A2, FBL | TYMS 3910/4885CRHBP 1336/4885CRHR2 1405/4885 |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | TYMS 4402/4885CRHBP 2211/4885CRHR2 1525/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | TYMS 4084/4885CRHBP 4579/4885CRHR2 3221/4885 |
| US-11137686-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method | MLLT1, PRDM9, NAP1L1 | TYMS 4108/4885CRHBP 4769/4885CRHR2 4378/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | TYMS 4084/4885CRHBP 4579/4885CRHR2 3221/4885 |
| US-11143962-B2 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method | MLLT1, MLLT3, KDM2B | TYMS 4258/4885CRHBP 4691/4885CRHR2 4555/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.