SCHEMBL7133804

SCHEMBL7133804

N=C(N)NCCCC(C(=O)O)N(C(=O)c1ccccc1)C(=O)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.36
F10 P00742 2/20 0.36
C3AR1 Q16581 1/20 0.36
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
TPSAB1 Q15661 2/20 0.35
F2 P00734 1/20 0.35
PRSS1 P07477 1/20 0.35
FOLH1 Q04609 1/20 0.35
HDAC3 O15379 2/20 0.35
HDAC1 Q13547 2/20 0.35
HDAC2 Q92769 2/20 0.35
NAAA Q02083 1/20 0.35
HDAC4 P56524 1/20 0.35
HDAC7 Q8WUI4 1/20 0.35
HDAC10 Q969S8 1/20 0.35
HDAC11 Q96DB2 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
HDAC9 Q9UKV0 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7133816 1.00 EPHX2 (0.36) EPHX2F10C3AR1NPC1RAB9A
SCHEMBL6570846 0.88 EPHX2 (0.36) EPHX2F10C3AR1NPC1RAB9A
Hydrochloric Acid SCHEMBL27905179 0.87 FOLH1 (0.36) F10C3AR1NPC1TPSAB1F2
SCHEMBL27576022 0.85 CTSK (0.39) EPHX2F10TPSAB1F2FOLH1
SCHEMBL28205669 0.83 SLC7A5 (0.43)
SCHEMBL28205672 0.83 SLC7A5 (0.43)
SCHEMBL757757 0.81 C3AR1 (0.39) EPHX2F10C3AR1NPC1RAB9A
SCHEMBL757758 0.81 C3AR1 (0.39) EPHX2F10C3AR1NPC1RAB9A
SCHEMBL2673036 0.80 ALOX15 (0.36)
SCHEMBL2673040 0.80 ALOX15 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6585786-B2 Slurry for chemical mechanical polishing NEC ELECTRONICS CORPORATION (JP) 2003-07-01 US disclosed
US-20020095874-A1 Slurry for chemical mechanical polishing NEC CORPORATION 2002-07-25 US disclosed