SCHEMBL7159337

SCHEMBL7159337

CCCCC(CC)CN(CC(CC)CCCC)Cn1nnc2cc(C(=O)O)ccc21

nearest known ligand 0.61

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ HCAR3 P49019 16/20 0.61
▸ PLA2G4A P47712 1/20 0.46
▸ HPGD P15428 1/20 0.46
▸ HCAR2 Q8TDS4 1/20 0.46
▸ RXRA P19793 2/20 0.42
▸ MAPT P10636 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30038487 1.00 HCAR3 (0.61) HCAR3PLA2G4AHPGDHCAR2RXRA
SCHEMBL729723 0.84 HCAR3 (0.39) HCAR3MAPT
SCHEMBL29897702 0.83 HCAR3 (0.71) HCAR3PLA2G4AHPGDHCAR2RXRA
SCHEMBL27095773 0.83 HCAR3 (0.71) HCAR3PLA2G4AHPGDHCAR2RXRA
SCHEMBL4378316 0.83 HCAR3 (0.52) HCAR3PLA2G4AHPGDRXRAMAPT
SCHEMBL29897704 0.81 HCAR3 (0.70) HCAR3PLA2G4AHPGDHCAR2RXRA
SCHEMBL27095778 0.81 HCAR3 (0.70) HCAR3PLA2G4AHPGDHCAR2RXRA
SCHEMBL29897713 0.81 HCAR3 (0.62) HCAR3HPGDHCAR2
SCHEMBL27095788 0.81 HCAR3 (0.62) HCAR3HPGDHCAR2
SCHEMBL238663 0.80 SLC9A1 (0.55) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 — — US disclosed
US-20150153647-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR PRODUCING WIRING BOARD RESONAC CORPORATION (JP) 2015-06-04 — — US disclosed
EP-2857899-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING WIRING BOARD Hitachi Chemical Company, Ltd. (JP) 2015-04-08 — — EP disclosed
US-6555290-B1 A blends comprising a binder polymer having carboxyl groups, a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group and a triazine trione group in the molecule, and a photoinitiator HITACHI CHEMICAL CO., LTD. (JP) 2003-04-29 — — US disclosed
US-6228560-B1 PHOTOPOLYMERIZATION; PHOTOINITIATOR HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-05-08 — — US disclosed
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