SCHEMBL4378316

SCHEMBL4378316

CCCCC(CC)CN(Cn1nnc2cc(C(=O)O)ccc21)c1ccc(OC)cc1

nearest known ligand 0.52

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ HCAR3 P49019 12/20 0.52
▸ MAPT P10636 2/20 0.48
▸ PLA2G4A P47712 2/20 0.46
▸ RXRA P19793 2/20 0.41
▸ KDM4E B2RXH2 1/20 0.41
▸ ALDH1A1 P00352 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ MGAM O43451 2/20 0.40
▸ AMY1A P0DUB6 2/20 0.40
▸ GAA P10253 2/20 0.40
▸ SI P14410 2/20 0.40
▸ MGAM2 Q2M2H8 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7159337 0.83 HCAR3 (0.61) HCAR3MAPTPLA2G4ARXRAHPGD
SCHEMBL30038487 0.83 HCAR3 (0.61) HCAR3MAPTPLA2G4ARXRAHPGD
SCHEMBL1134686 0.72 ALDH1A1 (0.51) MAPTKDM4EALDH1A1
SCHEMBL17541434 0.72 TDP1 (0.46) MAPTKDM4EALDH1A1GAA
SCHEMBL27095772 0.72 HCAR3 (0.53) HCAR3MAPTPLA2G4ARXRAHPGD
SCHEMBL29897702 0.72 HCAR3 (0.71) HCAR3PLA2G4ARXRAHPGD
SCHEMBL27095773 0.72 HCAR3 (0.71) HCAR3PLA2G4ARXRAHPGD
SCHEMBL6044668 0.72 HCAR3 (0.77) HCAR3MAPTPLA2G4AHPGDMGAM
SCHEMBL16610515 0.71 HCAR3 (0.62) HCAR3MAPTKDM4EHPGD
SCHEMBL18033713 0.70 HCAR3 (0.53) HCAR3PLA2G4ARXRAALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8263313-B2 Photosensitive resin composition and photosensitive film made with the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-09-11 — — US disclosed
US-8263313-B2 Photosensitive resin composition and photosensitive film made with the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-09-11 — — US disclosed
US-8263313-B2 Photosensitive resin composition and photosensitive film made with the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-09-11 — — US disclosed
US-20090297981-A1 Photosensitive Resin Composition and Photosensitive Film Made with the Same HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-12-03 — — US disclosed
US-20090297981-A1 Photosensitive Resin Composition and Photosensitive Film Made with the Same HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-12-03 — — US disclosed
US-20090297981-A1 Photosensitive Resin Composition and Photosensitive Film Made with the Same HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-12-03 — — US disclosed
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