Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX12 | P18054 | 2/20 | 0.42 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 5/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 3/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | CA5A | P35218 | 1/20 | 0.38 |
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.36 |
| ▸ | PGK1 | P00558 | 1/20 | 0.35 |
| ▸ | PGK2 | P07205 | 1/20 | 0.35 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.35 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthalene SCHEMBL29233861 | 1.00 | ALOX12 (0.42) | ALOX12CYP2A6PTPN1TSHRSMN1; SMN2 | |
| Anthracene SCHEMBL27569591 | 0.90 | PTPN1 (0.43) | CYP2A6PTPN1TSHRSMN1; SMN2CA2 | |
| Anthracene SCHEMBL21332717 | 0.90 | PTPN1 (0.43) | CYP2A6PTPN1TSHRSMN1; SMN2CA2 | |
| Naphthalene SCHEMBL28224059 | 0.87 | PTPN1 (0.35) | ALOX12CYP2A6PTPN1TSHRSMN1; SMN2 | |
| Phenanthrene SCHEMBL28237114 | 0.86 | ALDH1A1 (0.52) | CYP2A6TSHRCA2CA1CA9 | |
| Triphenylene SCHEMBL28448942 | 0.84 | PTPN1 (0.41) | PTPN1TSHRSMN1; SMN2CA2CA1 | |
| Triphenylene SCHEMBL1615352 | 0.84 | PTPN1 (0.41) | PTPN1TSHRSMN1; SMN2CA2CA1 | |
| Triphenylene SCHEMBL28454338 | 0.84 | PTPN1 (0.41) | PTPN1TSHRSMN1; SMN2CA2CA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1712877 | 0.84 | CA2 (0.53) | ALOX12PTPN1TSHRSMN1; SMN2CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL28212083 | 0.84 | CYP1A2 (0.63) | CYP2A6PTPN1CA2CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116742135-A | High-voltage electrolyte for lithium battery | 浙江大学 | 2023-09-12 | — | — | CN | claimed |
| US-6380339-B1 | REPEATING UNITS OF MALEIC ANHYDRIDE, NORBORNENE WITH AN ACID-LABILE GROUP, AND A VINYL WITH A SILICON CONTAINING GROUP | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2002-04-30 | — | — | US | claimed |
| US-20020042485-A1 | SILICON-CONTAINING VINYL COPOLYMER AND RESIST COMPOSITION CONTAINING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | 2002-04-11 | — | — | US | claimed |
| US-6114084-A | COPOLYMERS AND TERPOLYMERS USED IN CHEMICALLY AMPLIFIED RESISTS | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2000-09-05 | — | — | US | claimed |
| EP-0836119-A1 | Chemically amplified resist composition | Samsung Electronics Co., Ltd. (KR) | 1998-04-15 | — | — | EP | claimed |
| CN-119101024-A | Organic compound and light-emitting device | 株式会社半导体能源研究所 | 2024-12-10 | — | — | CN | disclosed |
| CN-114621133-B | Organic compound, organic electroluminescent material and light-emitting element | 上海八亿时空先进材料有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-116742135-A | High-voltage electrolyte for lithium battery | 浙江大学 | 2023-09-12 | — | — | CN | disclosed |
| CN-110832618-B | Photoactive inorganic ligand-capped inorganic nanocrystals | 芝加哥大学 | 2023-09-12 | — | — | CN | disclosed |
| CN-114651212-A | Positive photosensitive material | 默克专利股份有限公司 | 2022-06-21 | — | — | CN | disclosed |
| CN-114621133-A | Organic compound, organic electroluminescent material and light-emitting element | 上海八亿时空先进材料有限公司 | 2022-06-14 | — | — | CN | disclosed |
| CN-110627601-A | Organic photoelectric semiconductor material and preparation method and application thereof | 天津大学 | 2019-12-31 | — | — | CN | disclosed |
| CN-101808985-B | Method for synthesizing organic sulfur compound using sulfide and organic sulfur indium complex | KNU INDUSTRY COOPERATION FOUND | 2013-07-31 | — | — | CN | disclosed |
| CN-101808985-A | Method for synthesizing organic sulfur compound using sulfide and organic sulfur indium complex | KNU INDUSTRY COOPERATION FOUND | 2010-08-18 | — | — | CN | disclosed |
| US-6538086-B1 | 2-Methyl-2-(bicyclo(2.2.1)heptane) protective group; etch resistant amplified resists | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2003-03-25 | — | — | US | disclosed |
| US-6380339-B1 | REPEATING UNITS OF MALEIC ANHYDRIDE, NORBORNENE WITH AN ACID-LABILE GROUP, AND A VINYL WITH A SILICON CONTAINING GROUP | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2002-04-30 | — | — | US | disclosed |
| US-20020042485-A1 | SILICON-CONTAINING VINYL COPOLYMER AND RESIST COMPOSITION CONTAINING THE SAME | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | 2002-04-11 | — | — | US | disclosed |
| US-6280903-B1 | PHOTORESISTS OF NORBORNENE SUCCINIC ANHYDRIDE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-08-28 | — | — | US | disclosed |
| US-6114084-A | COPOLYMERS AND TERPOLYMERS USED IN CHEMICALLY AMPLIFIED RESISTS | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2000-09-05 | — | — | US | disclosed |
| EP-0836119-A1 | Chemically amplified resist composition | Samsung Electronics Co., Ltd. (KR) | 1998-04-15 | — | — | EP | disclosed |