Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | KIF11 | P52732 | 2/20 | 0.46 |
| ▸ | RXRA | P19793 | 3/20 | 0.41 |
| ▸ | RXRB | P28702 | 3/20 | 0.41 |
| ▸ | RXRG | P48443 | 2/20 | 0.41 |
| ▸ | NR2E1 | Q9Y466 | 1/20 | 0.41 |
| ▸ | IKBKB | O14920 | 1/20 | 0.40 |
| ▸ | PTPN5 | P54829 | 2/20 | 0.38 |
| ▸ | IDO1 | P14902 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | NOS3 | P29474 | 1/20 | 0.37 |
| ▸ | NOS2 | P35228 | 1/20 | 0.37 |
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | KDM1A | O60341 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29576147 | 1.00 | TSHR (0.50) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL9315932 | 0.97 | TSHR (0.48) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL23045013 | 0.92 | KIF11 (0.44) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL30600349 | 0.92 | KIF11 (0.44) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL3785139 | 0.89 | KIF11 (0.65) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL8741826 | 0.87 | TSHR (0.55) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL3783746 | 0.87 | KIF11 (0.54) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL30087058 | 0.87 | KIF11 (0.54) | TSHRMAPK1KIF11RXRARXRB | |
| SCHEMBL130383 | 0.86 | TSHR (0.56) | TSHRMAPK1KIF11NR2E1IKBKB | |
| SCHEMBL394717 | 0.86 | TSHR (0.56) | TSHRMAPK1KIF11NR2E1PTPN5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220177650-A1 | POLYIMIDE FILM PREPARATION METHOD AND APPLICATION THEREOF | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2022-06-09 | — | — | US | claimed |
| WO-2020200229-A1 | POLYIMIDE THIN FILM AND PREPARATION METHOD AND APPLICATION THEREOF | 中国科学院化学研究所 | 2020-10-08 | — | — | WO | claimed |
| EP-1382644-B1 | Photosensitive polyimide resin precursor composition, optical waveguide using the polyimide and process for producing the optical waveguide | NITTO DENKO CORP (JP) | 2007-09-12 | — | — | EP | claimed |
| US-7037637-B2 | Photosensitive polyimide resin precursor composition, optical polyimide obtained from the composition, optical waveguide using the polyimide, and process for producing the optical waveguide | NITTO DENKO CORPORATION (JP) | 2006-05-02 | — | — | US | claimed |
| US-20040013953-A1 | Photosensitive polyimide resin precursor composition, optical polyimide obtained from the composition, optical waveguide using the polyimide, and process for producing the optical waveguide | NITTO DENKO CORPORATION | 2004-01-22 | — | — | US | claimed |
| EP-1382644-A1 | Photosensitive polyimide resin precursor composition, optical waveguide using the polyimide and process for producing the optical waveguide | NITTO DENKO CORPORATION (JP) | 2004-01-21 | — | — | EP | claimed |
| US-12415892-B2 | Polyimide film preparation method and application thereof | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2025-09-16 | — | — | US | disclosed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | disclosed |
| WO-2023195206-A1 | POLYIMIDE PRECURSOR COMPOSITION AND POLYIMIDE | ＪＦＥケミカル株式会社 | 2023-10-12 | — | — | WO | disclosed |
| US-20220177650-A1 | POLYIMIDE FILM PREPARATION METHOD AND APPLICATION THEREOF | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2022-06-09 | — | — | US | disclosed |
| WO-2020200229-A1 | POLYIMIDE THIN FILM AND PREPARATION METHOD AND APPLICATION THEREOF | 中国科学院化学研究所 | 2020-10-08 | — | — | WO | disclosed |
| US-10704008-B2 | Heat-conductive silicone grease composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-07 | — | — | US | disclosed |
| US-6001517-A | A THERMOSETTING POLYMER WHICH CAN BE CURED THROUGH CYCLODEHYDRATION UPON HEATING AND A CURE ACCELERATOR WHICH CAN BE DEACTIVATED OF ITS CURE ACCELERATION PROPERTY BY IRRIDIATION OF LIGHT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-12-14 | — | — | US | disclosed |
| US-5840369-A | SCREEN PRINTING POLYIMIDE PRECURSOR INK ON SUBSTRATE, REMOVING SOLVENT, THERMALLY CURING INK TO FORM POLYIMIDE RELIEF PATTERN FILM | CENTRAL GLASS CO., LTD. (JP) | 1998-11-24 | — | — | US | disclosed |
| US-5756650-A | COMPOSITION COMPRISING POLYAMIC ACID, CURE ACCELERATOR SELECTED FROM GROUP CONSISTING OF NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AMINO ACID COMPOUND, AROMATIC COMPOUND HAVING TWO OR MORE HYDROXYL GROUPS | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-26 | — | — | US | disclosed |
| US-5686525-A | THIXOTROPIC SCREEN PRINTING INK COMPRISING A HEAT TREATED POLYAMIC ACID SOLUTION OBTAINED BY REACTION OF AROMATIC TETRACARBOXYLIC ACID, DIAMINE AND A MALEIMIDE; RELIEF IMAGES | CENTRAL GLASS COMPANY, LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| US-5578697-A | DIELECTRIC POLYMERS FOR ELECTRONICS | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-11-26 | — | — | US | disclosed |
| EP-0659800-A1 | Polyimide precursor composition, polyimide composition and process for the production of said polyimide composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 1995-06-28 | — | — | EP | disclosed |
| WO-1995004305-A1 | PHOTOSENSITIVE FLUORINATED POLY(AMIC ACID) AMINOACRYLATE SALT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-02-09 | — | — | WO | disclosed |