Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 1/20 | 0.48 |
| ▸ | P2RX4 | Q99571 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | P2RX1 | P51575 | 1/20 | 0.43 |
| ▸ | P2RX3 | P56373 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 3/20 | 0.42 |
| ▸ | RAB9A | P51151 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.42 |
| ▸ | MGLL | Q99685 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1907307 | 0.85 | FAAH (0.53) | FAAHKMT2AMEN1ALDH1A1CYP2C9 | |
| SCHEMBL9880595 | 0.81 | HTR2C (0.48) | P2RX4KMT2AMEN1NPSR1P2RX1 | |
| SCHEMBL14946884 | 0.79 | MCL1 (0.52) | KMT2AMEN1NPC1RAB9ASMN1; SMN2 | |
| SCHEMBL14946975 | 0.78 | MRGPRX4 (0.49) | — | |
| SCHEMBL22784012 | 0.78 | ALDH1A1 (0.44) | P2RX4KMT2AMEN1NPSR1P2RX1 | |
| SCHEMBL20173266 | 0.78 | HTR2C (0.45) | P2RX4KMT2AMEN1NPSR1P2RX1 | |
| SCHEMBL14946891 | 0.78 | FAAH (0.48) | FAAHKMT2AMEN1NPSR1ALDH1A1 | |
| SCHEMBL16432932 | 0.77 | MEN1 (0.48) | KMT2AMEN1MCL1 | |
| SCHEMBL6554136 | 0.76 | ALDH1A1 (0.42) | P2RX4KMT2AMEN1NPSR1P2RX1 | |
| SCHEMBL21800292 | 0.76 | MAPK14 (0.41) | KMT2AMEN1NPSR1ALDH1A1CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-2002540192-A | — | — | 2002-11-26 | — | — | JP | claimed |
| EP-1165511-A2 | METHOD OF PRODUCING HETEROCYCLIC CARBAMATES FROM AZA-HETEROCYCLIC COMPOUNDS AND CARBON DIOXIDE | GÖDECKE GMBH (DE) | 2002-01-02 | — | — | EP | claimed |
| WO-2000058286-A2 | METHOD OF PRODUCING HETEROCYCLIC CARBAMATES FROM AZA-HETEROCYCLIC COMPOUNDS AND CARBON DIOXIDE | Gödecke GmbH (DE) | 2000-10-05 | — | — | WO | claimed |
| US-8808964-B2 | Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8808964-B2 | Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8778591-B2 | — | — | 2014-07-15 | — | — | US | disclosed |
| US-8778591-B2 | — | — | 2014-07-15 | — | — | US | disclosed |
| US-8703384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-22 | — | — | US | disclosed |
| US-8703384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-22 | — | — | US | disclosed |
| US-20120135350-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-31 | — | — | US | disclosed |
| US-20120052441-A1 | NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120052441-A1 | NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |
| US-6566533-B1 | Reacting aza-heterocyclic compounds (indoles and carbazoles) with alkyl- or aryl-halides in the presence of carbon dioxide and alkali carbonate | WARNER-LAMBERT COMPANY LLC | 2003-05-20 | — | — | US | disclosed |
| EP-1165511-A2 | METHOD OF PRODUCING HETEROCYCLIC CARBAMATES FROM AZA-HETEROCYCLIC COMPOUNDS AND CARBON DIOXIDE | GÖDECKE GMBH (DE) | 2002-01-02 | — | — | EP | disclosed |
| WO-2000058286-A2 | METHOD OF PRODUCING HETEROCYCLIC CARBAMATES FROM AZA-HETEROCYCLIC COMPOUNDS AND CARBON DIOXIDE | Gödecke GmbH (DE) | 2000-10-05 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120052441-A1 | NITROGEN-CONTAINING ORGANIC COMPOUND, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS | AHNAK, POLL, NUDC | FAAH 2833/4885P2RX4 570/4885KMT2A 598/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.