SCHEMBL7176202

SCHEMBL7176202

OP(Oc1ccc(-c2ccccc2)cc1)Oc1ccc(-c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP3 P08254 1/20 0.44
BCL2L1 Q07817 1/20 0.44
ALDH1A1 P00352 2/20 0.43
CYP1A2 P05177 2/20 0.42
GAA P10253 1/20 0.42
CYP2C9 P11712 1/20 0.42
PKM P14618 1/20 0.42
CYP2C19 P33261 1/20 0.42
CA1 P00915 3/20 0.42
CA2 P00918 3/20 0.42
CA9 Q16790 2/20 0.42
PPARG P37231 8/20 0.42
PPARA Q07869 6/20 0.42
FFAR1 O14842 1/20 0.40
MGLL Q99685 1/20 0.39
ESR1 P03372 1/20 0.39
ESR2 Q92731 1/20 0.39
MAPK1 P28482 1/20 0.39
CA12 O43570 1/20 0.39
CYP3A4 P08684 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL21680837 0.93 ALDH1A1 (0.45) MMP3BCL2L1ALDH1A1CYP1A2GAA
SCHEMBL7707561 0.86 MMP3 (0.44) MMP3BCL2L1ALDH1A1CYP1A2GAA
SCHEMBL30883096 0.85 LTA4H (0.45) ALDH1A1CYP2C9CYP2C19CA1CA2
SCHEMBL132913 0.85 LTA4H (0.45) ALDH1A1CYP2C9CYP2C19CA1CA2
Hydrochloric Acid SCHEMBL9814237 0.82 LTA4H (0.43) ALDH1A1CA1CA2FFAR1
SCHEMBL28345841 0.82 LTA4H (0.43) ALDH1A1CA1CA2FFAR1
SCHEMBL28831578 0.82 LTA4H (0.43) ALDH1A1CA1CA2FFAR1
SCHEMBL7009097 0.82 LTA4H (0.43) ALDH1A1CA1CA2FFAR1
SCHEMBL8978293 0.82 LTA4H (0.43) ALDH1A1CA1CA2FFAR1
Phosphine SCHEMBL28033415 0.82 LTA4H (0.43) ALDH1A1CA1CA2FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6579829-B2 Aromatic sulfonamide compound MITSUI CHEMICALS, INC. (JP) 2003-06-17 US disclosed
US-20010036903-A1 Developer composition and heat sensitive recording material MITSUI CHEMICALS, INC. (JP) 2001-11-01 US disclosed
EP-1138517-A2 Developer composition and heat sensitive recording material Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed