SCHEMBL7181023

SCHEMBL7181023

C=Cc1ccc(OC(OCC)c2ccccc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
TAAR1 Q96RJ0 1/20 0.41
ACHE P22303 7/20 0.40
PTGS2 P35354 7/20 0.40
BCHE P06276 6/20 0.40
RELA Q04206 1/20 0.39
ALDH1A1 P00352 1/20 0.38
TSHR P16473 1/20 0.38
CHRNA7 P36544 2/20 0.38
CHRNB2 P17787 1/20 0.38
CHRNB4 P30926 1/20 0.38
CHRNA3 P32297 1/20 0.38
CHRNA4 P43681 1/20 0.38
LTB4R Q15722 2/20 0.38
LTB4R2 Q9NPC1 2/20 0.38
SLC6A4 P31645 1/20 0.35
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7271944 0.87 PTGS2 (0.42) ACHEPTGS2BCHERELAALDH1A1
SCHEMBL7269845 0.87 PTGS2 (0.42) MEN1KMT2AACHEPTGS2BCHE
SCHEMBL5023818 0.84 ALDH1A1 (0.39) MEN1KMT2AACHEPTGS2BCHE
SCHEMBL11856502 0.81 LTA4H (0.52) TSHRSLC6A4NPC1RAB9A
SCHEMBL15145397 0.80 PTGS2 (0.57) ACHEPTGS2BCHEALDH1A1TSHR
SCHEMBL7209894 0.78 PPARA (0.43) RELAALDH1A1TSHRCHRNA7CHRNB2
SCHEMBL10182877 0.77 SLC7A5 (0.53) MEN1KMT2ATAAR1ALDH1A1TSHR
SCHEMBL7209895 0.77 SLC6A4 (0.40) MEN1KMT2ATAAR1ACHERELA
SCHEMBL27680557 0.77 MEN1 (0.45) MEN1KMT2ATAAR1RELAALDH1A1
SCHEMBL8678809 0.76 SLC6A4 (0.35) MEN1KMT2ATAAR1ACHEPTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
US-6586152-B1 Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-07-01 US disclosed
EP-1059563-A1 Agent for reducing substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 2000-12-13 EP disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed