SCHEMBL7181495

SCHEMBL7181495

Cc1ccc2c(C(=O)O)c(O)c(O)c(C)c2c1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LDHA P00338 10/20 1.00
LDHB P07195 10/20 1.00
ALB P02768 3/20 0.69
DHODH Q02127 3/20 0.47
CSNK2A1 P68400 1/20 0.43
POLB P06746 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
NPC1 O15118 1/20 0.39
ALDH1A1 P00352 1/20 0.39
MAPT P10636 1/20 0.39
HPGD P15428 1/20 0.39
HTT P42858 1/20 0.39
RAB9A P51151 1/20 0.39
KMT2A Q03164 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
GLRA3 O75311 1/20 0.39
GLRB P48167 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19202488 0.87 LDHA (0.77) LDHALDHBALBDHODHCSNK2A1
SCHEMBL19202493 0.84 LDHA (0.72) LDHALDHBALBDHODHCSNK2A1
SCHEMBL11114662 0.81 LDHA (0.69) LDHALDHBALBDHODHCSNK2A1
SCHEMBL25837400 0.81 LDHA (0.69) LDHALDHBALBPOLBKDM4E
SCHEMBL426471 0.81 LDHA (1.00) LDHALDHBALBDHODHCSNK2A1
SCHEMBL29750641 0.81 LDHA (1.00) LDHALDHBALBDHODHCSNK2A1
SCHEMBL19202489 0.80 LDHA (0.67) LDHALDHBALBDHODHCSNK2A1
SCHEMBL19202492 0.80 LDHA (0.67) LDHALDHBALBDHODHCSNK2A1
SCHEMBL19203138 0.79 LDHA (0.66) LDHALDHBALBDHODHKDM4E
SCHEMBL7183958 0.79 LDHA (1.00) LDHALDHBALBMAPTGLRA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed
US-11693313-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-04 US disclosed
US-20220179313-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-06-09 US disclosed
US-20220121118-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2022-04-21 US disclosed
US-20210149303-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-20 US disclosed
US-20210149302-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-20 US disclosed
US-20200183275-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-11 US disclosed
US-20200183273-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-11 US disclosed
EP-0980350-A4 HYDROXYNAPHTHOIC ACIDS AND DERIVATIVES UNIV NEW MEXICO (US) 2003-01-02 EP disclosed
US-6124498-A Hydroxynaphthoic acids and derivatives UNIVERSITY OF NEW MEXICO (US) 2000-09-26 US disclosed
EP-0980350-A2 HYDROXYNAPHTHOIC ACIDS AND DERIVATIVES The University of New Mexico (US) 2000-02-23 EP disclosed
WO-1998049130-A2 HYDROXYNAPHTHOIC ACIDS AND DERIVATIVES THE UNIVERSITY OF NEW MEXICO (US) 1998-11-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11693313-B2 Resist composition and method of forming resist pattern C1R, C1S, C9 LDHA 3408/4885LDHB 2908/4885ALB 2518/4885
US-20200183273-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND SLC11A2, RPP30, RDX LDHA 1941/4885LDHB 2125/4885ALB 823/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.