SCHEMBL7187525

SCHEMBL7187525

CS(=O)(=O)c1ccc(CO[PH](=O)OCc2ccc(S(C)(=O)=O)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 4/20 0.47
ENPP2 Q13822 2/20 0.47
CA2 P00918 2/20 0.40
CA9 Q16790 2/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CYP4F2 P78329 1/20 0.39
CYP4A11 Q02928 1/20 0.39
DAO P14920 1/20 0.39
RORC P51449 1/20 0.36
KCNJ1 P48048 1/20 0.36
KCNH2 Q12809 1/20 0.36
EPHX2 P34913 1/20 0.36
NR1H4 Q96RI1 1/20 0.36
EPHX1 P07099 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5522736 0.78 PTGS2 (0.70) PTGS2ENPP2CA2CA9CA12
SCHEMBL3850384 0.76 PTGS2 (0.50) PTGS2ENPP2CA2CA9CA12
SCHEMBL6480783 0.76 CA12 (0.68) PTGS2ENPP2CA2CA9CA12
SCHEMBL6020749 0.75 CA2 (0.32) CA2CA9
SCHEMBL5432093 0.75 AGXT (0.52) CA2CA9CA1KCNH2
SCHEMBL15836429 0.74 PTGS2 (0.53) PTGS2ENPP2CA2CA9CA12
SCHEMBL24507590 0.73 ENPP2 (0.52) PTGS2ENPP2CA2CA9CA12
SCHEMBL15840366 0.73 PTGS2 (0.47) PTGS2ENPP2CA2CA9CA12
SCHEMBL7433026 0.73 PTGS2 (0.47) PTGS2ENPP2CA2CA9CA12
SCHEMBL7433030 0.73 PTGS2 (0.47) PTGS2ENPP2CA2CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6572986-B2 Subjecting the phosphor, the organic phosphorus compound, and a polyurethane binder to dispersing processing in order to prepare a coating mixture, applying the coating on a substrate to form phoshor layer FUJI PHOTO FILM CO., LTD. (JP) 2003-06-03 US disclosed
US-20010053461-A1 Radiation image storage panel and process for producing the same FUJIFILM CORPORATION (JP) 2001-12-20 US disclosed