Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL7190992

CCC(C)Oc1ccc([S+](c2ccccc2)c2ccc(OC(C)CC)cc2)cc1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.38
ABCB1 P08183 1/20 0.36
ABCC1 P33527 1/20 0.36
MTNR1A P48039 1/20 0.36
MTNR1B P49286 1/20 0.36
KCNH2 Q12809 6/20 0.35
ACHE P22303 5/20 0.35
ACACB O00763 2/20 0.34
KDM4E B2RXH2 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
LMNA P02545 1/20 0.34
TSHR P16473 1/20 0.34
HTT P42858 1/20 0.34
HSD17B10 Q99714 1/20 0.34
GRM2 Q14416 1/20 0.34
GPR3 P46089 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL7805711 1.00 MAPT (0.38) MAPTABCB1ABCC1MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL7191675 0.95 ACACB (0.36) MAPTABCB1ABCC1MTNR1AMTNR1B
SCHEMBL7804668 0.84 CNR2 (0.44) MAPTABCB1ABCC1MTNR1AMTNR1B
SCHEMBL7797789 0.84 CNR2 (0.44) MAPTABCB1ABCC1MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL7172999 0.82 MAPT (0.38) MAPTABCB1ABCC1MTNR1AMTNR1B
Trifluoromethanesulfonic Acid SCHEMBL2785533 0.79
Trifluoromethanesulfonic Acid SCHEMBL36492 0.79 KCNH2 (0.46) KCNH2ACHEHTTGPR3
Trifluoromethanesulfonic Acid SCHEMBL3143626 0.79 KCNH2 (0.46) KCNH2ACHEHTTGPR3
Trifluoromethanesulfonic Acid SCHEMBL2572040 0.79 GPR3 (0.31) ACHEGPR3
Trifluoromethanesulfonic Acid SCHEMBL3144088 0.79 TSHR (0.47) KCNH2TSHRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6541179-B2 A chemically amplified, positive resist comprising a sulfonium salt compound as photoacid generator, a base resin containing a monomer having alicyclic structure, and a solvent; heat treatment and exposure SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-04-01 US disclosed
US-20010033990-A1 Resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-25 US disclosed