Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | ACHE | P22303 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | PGR | P06401 | 2/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | GPR3 | P46089 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3143626 | 1.00 | KCNH2 (0.46) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31720833 | 0.94 | KCNH2 (0.43) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL2324715 | 0.94 | KCNH2 (0.43) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL454992 | 0.94 | PKM (0.47) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31720793 | 0.93 | KCNH2 (0.42) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31720636 | 0.89 | APP (0.43) | KCNH2GAAKMT2AALDH1A1HTT | |
| Trifluoromethanesulfonic Acid SCHEMBL17536703 | 0.88 | KCNH2 (0.39) | KCNH2GAAKMT2AACHEALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31720772 | 0.88 | KEAP1 (0.43) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL2901812 | 0.88 | ACHE (0.47) | KCNH2KMT2APKMACHEALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL756009 | 0.88 | CES2 (0.41) | GAAKMT2APKMALDH1A1CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1870 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| US-12232338-B2 | Low-voltage operation dual-gate organic thin-film transistors and methods of manufacturing thereof | CORNING INCORPORATED (US) | 2025-02-18 | — | — | US | claimed |
| US-12187851-B2 | Network polymers and methods of making and using same | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2025-01-07 | — | — | US | claimed |
| CN-111045296-B | UV patternable polymer blend for organic thin film transistor | 康宁股份有限公司 | 2024-12-27 | — | — | CN | claimed |
| CN-118271977-A | Optical cement, circular polarizer and display device | 陕西晶彩明为科技有限公司 | 2024-07-02 | — | — | CN | claimed |
| CN-117826308-A | Optical film and preparation method thereof | 陕西晶彩明为科技有限公司 | 2024-04-05 | — | — | CN | claimed |
| CN-113929906-B | Self-crosslinkable isocyanurate polymer and anti-reflection coating composition, preparation method thereof and pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2023-07-04 | — | — | CN | claimed |
| US-20230119934-A1 | NETWORK POLYMERS AND METHODS OF MAKING AND USING SAME | UNIV COLORADO REGENTS (US) | 2023-04-20 | — | — | US | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-115561966-A | Chemical amplification type negative photosensitive polyimide coating adhesive and application | 明士(北京)新材料开发有限公司 | 2023-01-03 | — | — | CN | claimed |
| US-20030013037-A1 | Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-16 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-20020160301-A1 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-6063542-A | Polymer for positive photoresist and chemical amplification positive photoresist composition comprising the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2000-05-16 | — | — | US | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| US-5962185-A | Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-10-05 | — | — | US | claimed |
| US-5962186-A | Polymer for chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-10-05 | — | — | US | claimed |
| US-5882835-A | Positive photoresist resin and chemical amplified positive photoresist composition containing the same | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 1999-03-16 | — | — | US | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |