SCHEMBL7196008

SCHEMBL7196008

O=[PH](OCc1c(F)c(F)c(F)c(F)c1F)OCc1c(F)c(F)c(F)c(F)c1F

nearest known ligand 0.37

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
MAOB P27338 1/20 0.30
MMP1 P03956 1/20 0.30
MMP2 P08253 1/20 0.30
MMP9 P14780 1/20 0.30
MMP12 P39900 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25193454 0.72 MMP1 (0.37) MMP1MMP2MMP9MMP12
SCHEMBL29082508 0.69 TAAR1 (0.32)
SCHEMBL3691321 0.68 MMP1 (0.44) CA12CA1CA2CA7CA9
SCHEMBL3933366 0.67 CA12 (0.34) CA12CA1CA2CA7CA9
SCHEMBL778583 0.63 CA1 (0.41) CA12CA1CA2CA7CA9
SCHEMBL4570597 0.63 CA12 (0.37) CA12CA1CA2CA7CA9
SCHEMBL2093191 0.63 CA12 (0.33) CA12CA1CA2CA7CA9
SCHEMBL778189 0.63 CA12 (0.33) CA12CA1CA2CA7CA9
SCHEMBL2093193 0.63 CA12 (0.33) CA12CA1CA2CA7CA9
SCHEMBL14708745 0.63 CA12 (0.32) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117813933-A Non-halide based passivating agents for perovskite photovoltaics 南洋理工大学 2024-04-02 CN disclosed
CN-108258130-B Fluorine-containing self-assembled monolayer film for regulating and controlling surface energy and work function of indium tin oxide and preparation method thereof 天津大学 2020-03-06 CN disclosed
US-6572986-B2 Subjecting the phosphor, the organic phosphorus compound, and a polyurethane binder to dispersing processing in order to prepare a coating mixture, applying the coating on a substrate to form phoshor layer FUJI PHOTO FILM CO., LTD. (JP) 2003-06-03 US disclosed
US-20010053461-A1 Radiation image storage panel and process for producing the same FUJIFILM CORPORATION (JP) 2001-12-20 US disclosed