Terephthalic Acid

Terephthalic Acid

SCHEMBL7196429

C1CCC2(CC1)CC2.O=C(O)c1ccc(C(=O)O)cc1

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

OPRM1

The experimentally established mechanism targets of Terephthalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.55
TP53 P04637 1/20 0.55
SRD5A2 P31213 4/20 0.48
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
CA12 O43570 1/20 0.46
CA3 P07451 1/20 0.46
TYR P14679 1/20 0.46
DRD1 P21728 1/20 0.46
CA4 P22748 1/20 0.46
CA6 P23280 1/20 0.46
CA5A P35218 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
ALDH1A1 P00352 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
ALOX15 P16050 1/20 0.44
TPMT P51580 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Terephthalic Acid SCHEMBL448283 0.83 TSHR (0.80) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL28261396 0.83 TSHR (0.80) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL27613025 0.83 TSHR (0.80) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL27623313 0.82 TSHR (0.55) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL2790074 0.80 TP53 (0.52) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL7058811 0.80 TSHR (0.52) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL20240891 0.80 TSHR (0.75) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL20240888 0.80 TSHR (0.75) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL5907979 0.80 TSHR (0.75) TSHRTP53SRD5A2CA1CA2
Terephthalic Acid SCHEMBL9063584 0.80 TSHR (0.75) TSHRTP53SRD5A2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5140424-A None JP disclosed
JP-7054242-A None JP disclosed
JP-4110344-A None JP disclosed
EP-0838484-B1 FUNCTIONAL BLOCK COPOLYMER AND PROCESS FOR PREPARING THE SAME TAKIRON CO (JP) 2003-10-08 EP disclosed
US-6359081-B1 FOR COMPATIBILIZING TAKIRON CO., LTD. (JP) 2002-03-19 US disclosed
EP-0681620-B1 METHOD FOR PRODUCING A NONWOVEN AND NONWOVEN THEREBY OBTAINED LIBELTEX NV (BE) 1998-11-11 EP disclosed
EP-0838484-A1 FUNCTIONAL BLOCK COPOLYMER AND PROCESS FOR PREPARING THE SAME TAKIRON CO. LTD. (JP) 1998-04-29 EP disclosed
EP-0681620-A1 METHOD FOR PRODUCING A NONWOVEN AND NONWOVEN THEREBY OBTAINED LIBELTEX N.V. (BE) 1995-11-15 EP disclosed
JP-H0754242-A POLYESTER PILE WOVEN OR KNITTED FABRIC UNITIKA LTD 1995-02-28 JP disclosed
WO-1994017234-A1 METHOD FOR PRODUCING A NONWOVEN AND NONWOVEN THEREBY OBTAINED LIBELTEX N.V./S.A. (BE) 1994-08-04 WO disclosed
EP-0605194-A2 Transparent polycarbonate-polyester-blends GE PLASTICS JAPAN LIMITED (JP) 1994-07-06 EP disclosed
JP-H05140424-A HIGH-IMPACT POLYESTER RESIN COMPOSITION NIPPON G II PLAST KK 1993-06-08 JP disclosed
JP-H04110344-A IMPACT-RESISTANT POLYESTER RESIN COMPOSITION NIPPON G II PLAST KK 1992-04-10 JP disclosed
US-3996000-A USING THE EXHAUSTION PROCESS BAYER AKTIENGESELLSCHAFT (DT) 1976-12-07 US disclosed