SCHEMBL720061

SCHEMBL720061

C=C(CCCOC1CCCCC1)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 3/20 0.39
NPC1 O15118 1/20 0.38
EPHX1 P07099 3/20 0.33
TERT O14746 1/20 0.32
LMNA P02545 1/20 0.31
PTGDR2 Q9Y5Y4 1/20 0.31
THRA P10827 1/20 0.31
THRB P10828 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL465987 0.89 NPC1 (0.40) NAAANPC1EPHX1LMNATHRA
SCHEMBL3861976 0.82 ALDH1A1 (0.44) NAAANPC1EPHX1TERTLMNA
SCHEMBL12561363 0.80 TSHR (0.42) NAAANPC1EPHX1TERTLMNA
SCHEMBL26203437 0.78 NPC1 (0.42) NAAANPC1EPHX1TERTCYP2C19
SCHEMBL6657985 0.78 EPHX1 (0.35) NAAANPC1EPHX1LMNAPTGDR2
SCHEMBL701258 0.78 NAAA (0.57) NAAAEPHX1LMNASMN1; SMN2CYP2C19
SCHEMBL8500605 0.77 NAAA (0.33) NAAAEPHX1
SCHEMBL701582 0.76 NAAA (0.56) NAAAEPHX1LMNASMN1; SMN2CYP2C19
SCHEMBL22123617 0.76 TSHR (0.42) NAAATERTLMNAPTGDR2THRB
SCHEMBL9627095 0.76 NAAA (0.33) NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110028670-A Low-dielectric loss negative light-sensitive poly amic acid ester resin, resin combination, preparation method and application 明士新材料有限公司 2019-07-19 CN disclosed
US-9665019-B2 Electrophotographic photoconductor, production method thereof, and electrophotographic apparatus FUJI ELECTRIC CO., LTD. (JP) 2017-05-30 US disclosed
US-20150346614-A1 ELECTROPHOTOGRAPHIC PHOTOCONDUCTOR, PRODUCTION METHOD THEREOF, AND ELECTROPHOTOGRAPHIC APPARATUS FUJI ELECTRIC CO., LTD. (JP) 2015-12-03 US disclosed
US-9175242-B2 Fluid having improved lubricity properties EVONIK ROHMAX ADDITIVES GMBH (DE) 2015-11-03 US disclosed
US-20150299500-A1 CURABLE COMPOSITION CONTAINING SILICON-CONTAINING HIGHLY-BRANCHED POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-10-22 US disclosed
US-20140206823-A1 METHOD FOR REDUCING THE HALOGEN CONTENT OF A POLYMER EVONIK OIL ADDITIVES GMBH (DE) 2014-07-24 US disclosed
US-20120053100-A1 FLUID HAVING IMPROVED LUBRICITY PROPERTIES EVONIK ROHMAX ADDITIVES GMBH (DE) 2012-03-01 US disclosed