SCHEMBL701258

SCHEMBL701258

C=C(CCCC(=O)OC1CCCCC1)C(=O)O

nearest known ligand 0.57

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 2/20 0.57
SMN1; SMN2 Q16637 2/20 0.45
CYP2C19 P33261 1/20 0.42
HTT P42858 2/20 0.41
CYP19A1 P11511 2/20 0.39
EPHX1 P07099 2/20 0.38
ALDH1A1 P00352 4/20 0.36
LMNA P02545 3/20 0.36
KDM4E B2RXH2 1/20 0.36
HPGD P15428 1/20 0.36
GAA P10253 1/20 0.35
PDE3B Q13370 1/20 0.35
PDE3A Q14432 1/20 0.35
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL701582 0.98 NAAA (0.56) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL6838096 0.91 NAAA (0.46) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL4570309 0.86 NAAA (0.72) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL19150279 0.86 NAAA (0.72) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL701604 0.84 NAAA (0.44) NAAASMN1; SMN2CYP19A1ALDH1A1GAA
SCHEMBL1980866 0.84 NAAA (0.71) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL9469654 0.82 NAAA (0.64) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL17675641 0.82 NAAA (0.79) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL207867 0.82 NAAA (0.79) NAAASMN1; SMN2CYP2C19HTTCYP19A1
SCHEMBL9816372 0.81 NAAA (0.63) NAAASMN1; SMN2CYP2C19HTTCYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843220-B1 Radiation sensitive resin composition JSR CORP (JP) 2003-02-19 EP claimed
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
US-9788420-B2 Substrate and touch panel member using same TORAY INDUSTRIES, INC. (JP) 2017-10-10 US disclosed
US-9690197-B2 Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method TORAY INDUSTRIES, INC. (JP) 2017-06-27 US disclosed
US-9510444-B2 2016-11-29 US disclosed
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160161847-A1 NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD TORAY INDUSTRIES, INC. (JP) 2016-06-09 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-20150366055-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES, INC. (JP) 2015-12-17 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-7897821-B2 Sulfonium compound JSR CORPORATION (JP) 2011-03-01 US disclosed
US-20100324329-A1 COMPOUND JSR CORPORATION (JP) 2010-12-23 US disclosed
US-20100285405-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-11-11 US disclosed
US-20100239981-A1 POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-23 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100068650-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR CORPORATION (JP) 2010-03-18 US disclosed
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR CORPORATION (JP) 2010-03-11 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN ASIC1, RER1, RPS10 NAAA 335/4885SMN1; SMN2 752/4885CYP2C19 3693/4885
US-20100324329-A1 COMPOUND AFF2, AFF1, AFF4 NAAA 2865/4885SMN1; SMN2 1699/4885CYP2C19 1478/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.